Known targets — ChEMBL curated mechanism
ACEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2BTKCACNA1CCACNA1DCACNA1FCACNA1SCCR5CPT1BCPT2DPP4DRD1DRD2EGFRERBB2ERBB4HRH1HRH3HTR1AHTR2AHTR2BHTR2CHTR4JAK1JAK2JAK3MPLMTORPPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PPARGSLC6A2SLC6A3SLC6A4SMOTYK2pol
The experimentally established mechanism targets of Maleic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HCAR2 | Q8TDS4 | 6/20 | 0.72 |
| ▸ | TSHR | P16473 | 8/20 | 0.50 |
| ▸ | HPGD | P15428 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.45 |
| ▸ | TP53 | P04637 | 4/20 | 0.45 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.45 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.45 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.45 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.42 |
| ▸ | THRB | P10828 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fumaric Acid SCHEMBL8925070 | 1.00 | HCAR2 (0.72) | HCAR2TSHRHPGDALDH1A1TP53 | |
| Fumaric Acid SCHEMBL10717462 | 1.00 | HCAR2 (0.72) | HCAR2TSHRHPGDALDH1A1TP53 | |
| Fumaric Acid SCHEMBL10717454 | 1.00 | HCAR2 (0.72) | HCAR2TSHRHPGDALDH1A1TP53 | |
| Maleic Acid SCHEMBL28317871 | 1.00 | HCAR2 (0.72) | HCAR2TSHRHPGDALDH1A1TP53 | |
| Ethyl Fumarate SCHEMBL1067038 | 0.96 | HCAR2 (0.80) | HCAR2TSHRHPGDALDH1A1TP53 | |
| Maleic Acid SCHEMBL11165865 | 0.94 | HCAR2 (0.64) | HCAR2TSHRHPGDALDH1A1TP53 | |
| Acrylic Acid Ethyl Ester SCHEMBL40332 | 0.91 | HCAR2 (0.58) | HCAR2TSHRHPGDALDH1A1TP53 | |
| Acrylic Acid Ethyl Ester SCHEMBL28020506 | 0.91 | HCAR2 (0.58) | HCAR2TSHRHPGDALDH1A1TP53 | |
| Acrylic Acid Ethyl Ester SCHEMBL8587658 | 0.91 | HCAR2 (0.58) | HCAR2TSHRHPGDALDH1A1TP53 | |
| Acrylic Acid Ethyl Ester SCHEMBL28059697 | 0.90 | HCAR2 (0.59) | HCAR2TSHRHPGDALDH1A1TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0461621-B1 | Image forming method | CANON KK (JP) | 1997-10-15 | — | — | EP | disclosed |
| US-5663032-A | NAPHTHOL DERIVATIVE REDUCING AGENT | CANON KABUSHIKI KAISHA (JP) | 1997-09-02 | — | — | US | disclosed |
| EP-0568023-B1 | Heat-developable photosensitive material | CANON KK (JP) | 1997-01-22 | — | — | EP | disclosed |
| US-5543286-A | CONTAINING AN ORGANIC SILVER SALT AND A PYRROLE COMPOUND;HIGH CONTRAST IMAGES | CANON KABUSHIKI KAISHA (JP) | 1996-08-06 | — | — | US | disclosed |
| EP-0509740-B1 | Heat-developable photosensitive material and image forming method making use of the heat-developable photosensitive material | CANON KK (JP) | 1996-06-26 | — | — | EP | disclosed |
| EP-0332455-B1 | Photosensitive material and image forming method | CANON KK (JP) | 1996-06-05 | — | — | EP | disclosed |
| EP-0330504-B1 | Photosensitive material and image forming method | CANON KK (JP) | 1996-05-22 | — | — | EP | disclosed |
| EP-0328364-B1 | Photosensitive material | CANON KK (JP) | 1996-05-08 | — | — | EP | disclosed |
| EP-0360014-B1 | Photosensitive material and image forming method using same | CANON KK (JP) | 1996-01-03 | — | — | EP | disclosed |
| US-5424174-A | Exposing and heating an organic silver salt, a silver halide and a reducing agent, water soluble polymeric layer and a hydrophobic polymeric layer; storage stability | CANON KABUSHIKI KAISHA (JP) | 1995-06-13 | — | — | US | disclosed |
| US-5064744-A | Heat, photopolymerization, silver halide contrast | CANON KABUSHIKI KAISHA (JP) | 1991-11-12 | — | — | US | disclosed |
| EP-0453125-A2 | Image forming method and image forming apparatus | CANON KABUSHIKI KAISHA (JP) | 1991-10-23 | — | — | EP | disclosed |
| EP-0453317-A2 | Image forming medium | CANON KABUSHIKI KAISHA (JP) | 1991-10-23 | — | — | EP | disclosed |
| US-5041369-A | Silver Halide, Silver Salt, Reducing Agent, Metal or Organic Dye | CANON KABUSHIKI KAISHA (JP) | 1991-08-20 | — | — | US | disclosed |
| US-5001032-A | Photosensitive material containing a photosensitive and heat developable element and a polymerizable layer and image-forming method utilizing the same | CANON KABUSHIKI KAISHA (JP) | 1991-03-19 | — | — | US | disclosed |
| EP-0360014-A1 | Photosensitive material and image forming method using same | CANON KABUSHIKI KAISHA (JP) | 1990-03-28 | — | — | EP | disclosed |
| EP-0332455-A2 | Photosensitive material and image forming method | CANON KABUSHIKI KAISHA (JP) | 1989-09-13 | — | — | EP | disclosed |
| EP-0330504-A2 | Photosensitive material and image forming method | CANON KABUSHIKI KAISHA (JP) | 1989-08-30 | — | — | EP | disclosed |
| EP-0328364-A2 | Photosensitive material | CANON KABUSHIKI KAISHA (JP) | 1989-08-16 | — | — | EP | disclosed |
| EP-0326424-A2 | Photosensitive composition, photosensitive material, and image forming method | CANON KABUSHIKI KAISHA (JP) | 1989-08-02 | — | — | EP | disclosed |