⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9464053 | 0.77 | — | — | |
| SCHEMBL8773279 | 0.73 | — | — | |
| SCHEMBL2761274 | 0.72 | LMNA (0.30) | — | |
| SCHEMBL896999 | 0.69 | — | — | |
| SCHEMBL10913195 | 0.69 | TSHR (0.38) | — | |
| SCHEMBL10774192 | 0.69 | — | — | |
| SCHEMBL3300416 | 0.69 | — | — | |
| SCHEMBL10939461 | 0.67 | — | — | |
| SCHEMBL10616524 | 0.63 | — | — | |
| SCHEMBL10935873 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0333591-B1 | Process for formation of resist patterns | FUJITSU LTD (JP) | 1997-10-29 | — | — | EP | claimed |
| US-5194364-A | Polymers from silane substituted acetylenes | FUJITSU LIMITED (JP) | 1993-03-16 | — | — | US | claimed |
| EP-0408334-A2 | Silicon-containing resists and microlithography using same | FUJITSU LIMITED (JP) | 1991-01-16 | — | — | EP | claimed |
| EP-0333591-A2 | Process for formation of resist patterns | FUJITSU LIMITED (JP) | 1989-09-20 | — | — | EP | claimed |
| EP-0333591-B1 | Process for formation of resist patterns | FUJITSU LTD (JP) | 1997-10-29 | — | — | EP | disclosed |
| US-5194364-A | Polymers from silane substituted acetylenes | FUJITSU LIMITED (JP) | 1993-03-16 | — | — | US | disclosed |
| EP-0408334-A2 | Silicon-containing resists and microlithography using same | FUJITSU LIMITED (JP) | 1991-01-16 | — | — | EP | disclosed |
| EP-0408334-A2 | Silicon-containing resists and microlithography using same | FUJITSU LIMITED (JP) | 1991-01-16 | — | — | EP | disclosed |
| EP-0333591-A2 | Process for formation of resist patterns | FUJITSU LIMITED (JP) | 1989-09-20 | — | — | EP | disclosed |