⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8773278 | 0.73 | — | — | |
| SCHEMBL896999 | 0.71 | — | — | |
| SCHEMBL10939461 | 0.69 | — | — | |
| SCHEMBL9464053 | 0.67 | — | — | |
| SCHEMBL1052046 | 0.66 | — | — | |
| SCHEMBL10935873 | 0.65 | — | — | |
| SCHEMBL10616524 | 0.65 | — | — | |
| SCHEMBL10635896 | 0.63 | — | — | |
| SCHEMBL2761274 | 0.63 | LMNA (0.30) | — | |
| SCHEMBL85727 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0333591-B1 | Process for formation of resist patterns | FUJITSU LTD (JP) | 1997-10-29 | — | — | EP | claimed |
| US-5194364-A | Polymers from silane substituted acetylenes | FUJITSU LIMITED (JP) | 1993-03-16 | — | — | US | claimed |
| EP-0408334-A2 | Silicon-containing resists and microlithography using same | FUJITSU LIMITED (JP) | 1991-01-16 | — | — | EP | claimed |
| EP-0333591-A2 | Process for formation of resist patterns | FUJITSU LIMITED (JP) | 1989-09-20 | — | — | EP | claimed |
| JP-60135413-A | — | — | None | — | — | JP | disclosed |
| EP-0333591-B1 | Process for formation of resist patterns | FUJITSU LTD (JP) | 1997-10-29 | — | — | EP | disclosed |
| US-5194364-A | Polymers from silane substituted acetylenes | FUJITSU LIMITED (JP) | 1993-03-16 | — | — | US | disclosed |
| EP-0325174-B1 | PROCESS FOR CONTROLLING THE MOLECULAR WEIGHT OF POLY(TRIALKYLSILYLPROPYNE) POLYMERS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1991-07-31 | — | — | EP | disclosed |
| EP-0408334-A2 | Silicon-containing resists and microlithography using same | FUJITSU LIMITED (JP) | 1991-01-16 | — | — | EP | disclosed |
| EP-0333591-A2 | Process for formation of resist patterns | FUJITSU LIMITED (JP) | 1989-09-20 | — | — | EP | disclosed |
| US-4859215-A | SILYL SUBSTITUTED POLYACETYLENE POLYMER | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1989-08-22 | — | — | US | disclosed |
| US-4808679-A | USING SILYL ETHERS OR POLYSILOXANES | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1989-02-28 | — | — | US | disclosed |
| US-4728431-A | Pervaporation method for separating liquids in mixture | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1988-03-01 | — | — | US | disclosed |
| US-4689267-A | Composite hollow fiber | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1987-08-25 | — | — | US | disclosed |
| US-4567245-A | Substituted polyacetylene copolymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1986-01-28 | — | — | US | disclosed |
| US-4567245-A | Substituted polyacetylene copolymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1986-01-28 | — | — | US | disclosed |
| JP-S60135413-A | SUBSTITUTED POLYACETYLENE COPOLYMER | SHIN ETSU CHEM CO LTD | 1985-07-18 | — | — | JP | disclosed |