SCHEMBL8784289

SCHEMBL8784289

COc1ccc(CC(c2ccc(OC)cc2OC)c2ccc(OC)cc2OC)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LDHA P00338 1/20 0.50
SLC6A4 P31645 1/20 0.49
CA12 O43570 1/20 0.47
CA1 P00915 1/20 0.47
CA2 P00918 1/20 0.47
CA7 P43166 1/20 0.47
CA9 Q16790 1/20 0.47
CA14 Q9ULX7 1/20 0.47
CYP1A2 P05177 1/20 0.46
CYP2D6 P10635 1/20 0.46
CYP2C19 P33261 1/20 0.46
TUBB4A P04350 1/20 0.45
TUBB P07437 1/20 0.45
TUBA3C P0DPH7 1/20 0.45
TUBA1B P68363 1/20 0.45
TUBA4A P68366 1/20 0.45
TUBB4B P68371 1/20 0.45
TUBB3 Q13509 1/20 0.45
TUBB2A Q13885 1/20 0.45
TUBB8 Q3ZCM7 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8784503 0.79 CYP1A2 (0.48) SLC6A4CA12CA1CA2CA7
SCHEMBL7002647 0.79 ADRA1A (0.57) CA12CA1CA2CA7CA9
SCHEMBL7040353 0.78 CYP1A2 (0.49) SLC6A4CYP1A2CYP2D6CYP2C19
SCHEMBL8784948 0.77 IDO1 (0.44) CA12CA1CA2CA7CA9
SCHEMBL9227321 0.76 MEN1 (0.43) CA12CA1CA2CA7CA9
SCHEMBL9055995 0.76 CA12 (0.47) CA12CA1CA2CA7CA9
SCHEMBL3296280 0.76 CA12 (0.47) CA12CA1CA2CA7CA9
SCHEMBL8785084 0.75 CA12 (0.60) CA12CA1CA2CA7CA9
SCHEMBL8145847 0.75 ALDH1A1 (0.50) CA12CA1CA2CA7CA9
SCHEMBL16713057 0.74 CYP1A2 (0.66) LDHASLC6A4CA12CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0703498-B1 Photosensitive resin composition and method for forming a photoresist pattern MITSUBISHI CHEM CORP (JP) 1997-12-29 EP disclosed
US-5698362-A CONTAINING A TRIARYLMETHANE DERIVATIVE; HIGH RESOLUTION, EXCELLENT IN DEPTH OF FOCUS AND PATTERN PROFILE, STORAGE STABLE MITSUBISHI CHEMICAL CORPORATION (JP) 1997-12-16 US disclosed
EP-0703498-A1 Photosensitive resin composition and method for forming a photoresist pattern MITSUBISHI CHEMICAL CORPORATION (JP) 1996-03-27 EP disclosed