SCHEMBL8784546

SCHEMBL8784546

COc1ccc(C(C)(c2ccccc2)c2ccccc2)cc1OC

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 2/20 0.50
▸ ESR2 Q92731 2/20 0.50
▸ CYP1A1 P04798 2/20 0.50
▸ CYP1A2 P05177 2/20 0.50
▸ CYP1B1 Q16678 2/20 0.50
▸ KIF11 P52732 2/20 0.46
▸ CA12 O43570 3/20 0.44
▸ CA9 Q16790 3/20 0.44
▸ CA1 P00915 2/20 0.44
▸ CA2 P00918 2/20 0.44
▸ CA7 P43166 2/20 0.44
▸ CA14 Q9ULX7 2/20 0.44
▸ CA4 P22748 1/20 0.44
▸ HTT P42858 1/20 0.44
▸ SMN1; SMN2 Q16637 1/20 0.44
▸ NQO2 P16083 1/20 0.42
▸ CYP19A1 P11511 1/20 0.42
▸ ACHE P22303 1/20 0.42
▸ MEN1 O00255 1/20 0.42
▸ KMT2A Q03164 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10315537 0.93 CA12 (0.50) ESR1ESR2CYP1A1CYP1A2CYP1B1
SCHEMBL15202655 0.87 SMN1; SMN2 (0.49) ESR1ESR2CYP1A1CYP1A2CYP1B1
SCHEMBL25620283 0.87 ESR1 (0.58) ESR1ESR2CYP1A1CYP1A2CYP1B1
SCHEMBL22051105 0.84 ALDH1A1 (0.48) ESR1ESR2KIF11HTTHSD17B10
SCHEMBL9163204 0.84 ESR1 (0.64) ESR1ESR2CA12CA9CA1
SCHEMBL16674087 0.82 CYP1A1 (0.47) CYP1A1CYP1A2CYP1B1KIF11CA12
SCHEMBL25066227 0.80 ESR1 (0.62) ESR1ESR2SMN1; SMN2CYP19A1MEN1
SCHEMBL8785612 0.79 ACHE (0.45) CYP1A1CYP1A2CYP1B1KIF11CA12
SCHEMBL8784747 0.79 HTT (0.50) CYP1A1CYP1A2CYP1B1KIF11CA12
SCHEMBL179467 0.77 CA2 (0.50) CYP1A2CA12CA9CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0703498-B1 Photosensitive resin composition and method for forming a photoresist pattern MITSUBISHI CHEM CORP (JP) 1997-12-29 — — EP disclosed
US-5698362-A CONTAINING A TRIARYLMETHANE DERIVATIVE; HIGH RESOLUTION, EXCELLENT IN DEPTH OF FOCUS AND PATTERN PROFILE, STORAGE STABLE MITSUBISHI CHEMICAL CORPORATION (JP) 1997-12-16 — — US disclosed
EP-0703498-A1 Photosensitive resin composition and method for forming a photoresist pattern MITSUBISHI CHEMICAL CORPORATION (JP) 1996-03-27 — — EP disclosed
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