SCHEMBL879168

SCHEMBL879168

CC[C@H](S)c1ccccc1

nearest known ligand 0.58

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.58
HKDC1 Q2TB90 1/20 0.45
TRPA1 O75762 1/20 0.45
AOC3 Q16853 1/20 0.44
NOS3 P29474 1/20 0.44
NOS2 P35228 1/20 0.44
POLB P06746 1/20 0.42
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
MIF P14174 1/20 0.42
HSD17B10 Q99714 1/20 0.41
TAAR1 Q96RJ0 2/20 0.41
HTR2A P28223 1/20 0.41
HRH1 P35367 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL577036 1.00 LMNA (0.58) LMNAHKDC1TRPA1AOC3NOS3
SCHEMBL13473250 1.00 LMNA (0.58) LMNAHKDC1TRPA1AOC3NOS3
SCHEMBL20497168 0.86 ESR1 (0.46) LMNAHSD17B10
SCHEMBL11779965 0.82 LMNA (0.44) LMNAHKDC1TRPA1AOC3
SCHEMBL4575359 0.80 AOC3 (0.46) LMNAAOC3TAAR1HTR2AHRH1
SCHEMBL3919544 0.80 AOC3 (0.46) LMNAAOC3TAAR1HTR2AHRH1
SCHEMBL1408602 0.79 TRPA1 (0.45) LMNATRPA1TAAR1HTR2A
SCHEMBL6401479 0.79 TRPA1 (0.45) LMNATRPA1TAAR1HTR2A
SCHEMBL19632871 0.79 TRPA1 (0.45) LMNATRPA1TAAR1HTR2A
SCHEMBL10700271 0.78 HTR2A (0.43) LMNATAAR1HTR2AHRH1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1273970-B1 Positive photosensitive composition FUJIFILM CORP (JP) 2012-03-28 EP disclosed
EP-1762599-A1 Ink composition, inkjet recording method, printed material, process for producing lithographic plate, and lithographic printing plate FUJIFILM Corporation (JP) 2007-03-14 EP disclosed
EP-1755000-A2 Positive resist composition and a pattern forming method using the same Fuji Photo Film Co., Ltd. (JP) 2007-02-21 EP disclosed