SCHEMBL8794243

SCHEMBL8794243

C=CC(=O)NCOC(C)CC

nearest known ligand 0.43

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.43
ALDH1A1 P00352 3/20 0.43
MAPK1 P28482 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
ZDHHC20 Q5W0Z9 1/20 0.42
ZDHHC2 Q9UIJ5 1/20 0.42
ACACB O00763 2/20 0.32
TGM2 P21980 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL644261 0.82 TSHR (0.48) TSHRALDH1A1MAPK1TDP1ZDHHC20
SCHEMBL14582983 0.82 ZDHHC20 (0.47) TSHRALDH1A1MAPK1TDP1ZDHHC20
SCHEMBL12192188 0.81 TSHR (0.39) TSHRALDH1A1MAPK1TDP1ZDHHC20
SCHEMBL15362263 0.80 ZDHHC20 (0.53) TSHRALDH1A1MAPK1TDP1ZDHHC20
SCHEMBL3394081 0.78 TSHR (0.43) TSHRALDH1A1MAPK1TDP1ZDHHC20
SCHEMBL17727675 0.76 TSHR (0.42) TSHRALDH1A1MAPK1TDP1ZDHHC20
SCHEMBL19821916 0.76 MTNR1A (0.37) TSHRALDH1A1MAPK1ACACB
SCHEMBL12267475 0.76 ZDHHC20 (0.38) TSHRALDH1A1MAPK1TDP1ZDHHC20
Hydrochloric Acid SCHEMBL11796910 0.75 TSHR (0.41) TSHRALDH1A1MAPK1TDP1ZDHHC20
SCHEMBL11258646 0.75 TSHR (0.41) TSHRALDH1A1MAPK1TDP1ZDHHC20

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4332657-A ADDITION POLYMER CONTAINING AN OXYMETHYLACRYLAMIDE, A MONOMER HAVING A HYDROXYL GROUP, AND ANOTHER UNSATURATED MONOMER KANSAI PAINT CO., LTD. (JP) 1982-06-01 US claimed
EP-4685230-A1 METHOD FOR PRODUCING NEURAL ORGANOIDS AND USE OF SAME KYOTO UNIVERSITY (JP) 2026-01-28 EP disclosed
WO-2025105395-A1 CELL CULTURE SUBSTRATE, METHOD FOR PRODUCING SAME, AND CELL CULTURE KIT 東ソー株式会社 2025-05-22 WO disclosed
WO-2024195789-A1 METHOD FOR PRODUCING NEURAL ORGANOIDS AND USE OF SAME 国立大学法人京都大学 2024-09-26 WO disclosed
US-20240218322-A1 CELL CULTURE SUBSTRATE AND METHOD FOR PRODUCING SAME, METHOD FOR INDUCING DIFFERENTIATION OF PLURIPOTENT STEM CELL, AND CELL CULTURE KIT TOSOH CORPORATION (JP) 2024-07-04 US disclosed
CN-118109145-A Adhesive composition, adhesive layer, polarizing plate with adhesive layer, and display device 住友化学株式会社 2024-05-31 CN disclosed
EP-4317407-A1 CELL CULTURE SUBSTRATE AND METHOD FOR PRODUCING SAME, METHOD FOR INDUCING DIFFERENTIATION OF PLURIPOTENT STEM CELL, AND CELL CULTURE KIT Tosoh Corporation (JP) 2024-02-07 EP disclosed
US-20230332102-A1 METHOD FOR INDUCING DIFFERENTIATION OF PLURIPOTENT STEM CELLS INTO ECTODERMAL, MESODERMAL, AND ENDODERMAL CELLS TOSOH CORPORATION (JP) 2023-10-19 US disclosed
CN-110249019-B Adhesive composition 住友化学株式会社 2023-05-26 CN disclosed
EP-4180515-A1 METHOD FOR INDUCING DIFFERENTIATION OF PLURIPOTENT STEM CELLS INTO ECTODERMAL, MESODERMAL, AND ENDODERMAL CELLS Tosoh Corporation (JP) 2023-05-17 EP disclosed
CN-110651017-A Adhesive composition 住友化学株式会社 2020-01-03 CN disclosed
CN-109957359-A A kind of pressure-sensitive adhesive composition 太仓斯迪克新材料科技有限公司 2019-07-02 CN disclosed
US-7235342-B2 Negative photoresist composition including non-crosslinking chemistry INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2007-06-26 US disclosed
US-7235342-B2 Negative photoresist composition including non-crosslinking chemistry INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2007-06-26 US disclosed
US-7182433-B2 Polymerizable composition, inkjet recording head, and process for producing inkjet recording head FUJI PHOTO FILM CO., LTD. (JP) 2007-02-27 US disclosed
US-5688598-A Non-blistering thick film coating compositions and method for providing non-blistering thick film coatings on metal surfaces MORTON INTERNATIONAL, INC. (US) 1997-11-18 US disclosed
EP-0407858-A1 Polymer composition having improved durability and method relating thereto THE B.F. GOODRICH COMPANY (US) 1991-01-16 EP disclosed
US-RE31985-E UNSATURATED POLYESTER, SURFACTANT AND THICKENER Dai Nippon Toryo Co, Ltd. (JP) 1985-09-17 US disclosed
US-4332657-A ADDITION POLYMER CONTAINING AN OXYMETHYLACRYLAMIDE, A MONOMER HAVING A HYDROXYL GROUP, AND ANOTHER UNSATURATED MONOMER KANSAI PAINT CO., LTD. (JP) 1982-06-01 US disclosed
US-4296014-A COMPRISING A POLYESTER-ACRYLIC CROSSLINKABLE GRAFT POLYMER AND A SURFACTANT OR THICKENER DAI NIPPON TORYO CO., LTD. (JP) 1981-10-20 US disclosed