SCHEMBL8823290

SCHEMBL8823290

CC(C)c1ccc(Nc2ccc(C(C)C)cc2-c2ccccc2)c(-c2ccccc2)c1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
METAP2 P50579 1/20 0.43
LMNA P02545 4/20 0.42
FABP3 P05413 1/20 0.39
FABP4 P15090 1/20 0.39
FABP5 Q01469 1/20 0.39
PTGS1 P23219 4/20 0.38
MEN1 O00255 3/20 0.38
KMT2A Q03164 3/20 0.38
PTGS2 P35354 2/20 0.38
MAPT P10636 2/20 0.38
FABP2 P12104 1/20 0.38
TSHR P16473 1/20 0.38
AKR1C4 P17516 1/20 0.38
ADRA2B P18089 1/20 0.38
CHRM3 P20309 1/20 0.38
HTR2C P28335 1/20 0.38
DRD3 P35462 1/20 0.38
AKR1C3 P42330 1/20 0.38
AKR1C2 P52895 1/20 0.38
AKR1C1 Q04828 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10878363 0.80 LMNA (0.54) METAP2LMNAPTGS1MEN1KMT2A
SCHEMBL21708222 0.78 MCOLN3 (0.54) METAP2LMNAMEN1KMT2AMAPT
SCHEMBL9177210 0.77 LMNA (0.50) METAP2LMNAPTGS1MEN1KMT2A
SCHEMBL3293062 0.77 LMNA (0.45) METAP2LMNAPTGS1MEN1KMT2A
SCHEMBL28139610 0.77 LMNA (0.45) METAP2LMNAPTGS1MEN1KMT2A
SCHEMBL23463247 0.76 TP53 (0.39) MEN1KMT2AMAPTAKR1C3AKR1C2
SCHEMBL13524519 0.76 CYP2A6 (0.48) METAP2LMNAPTGS1MEN1KMT2A
SCHEMBL13524522 0.76 LMNA (0.50) METAP2LMNAPTGS1MEN1KMT2A
SCHEMBL4282140 0.76 PTPN5 (0.57) METAP2LMNAPTGS1MEN1KMT2A
SCHEMBL7435713 0.76 ALDH1A1 (0.48) METAP2LMNAPTGS1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0308960-B1 Ethylene-acrylic acid ester copolymer and process for producing the same SUMITOMO CHEMICAL CO (JP) 1997-01-08 EP disclosed
US-4987199-A Low deformation during vulcanization, high dimensional accuracy SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1991-01-22 US disclosed
EP-0308960-A2 Ethylene-acrylic acid ester copolymer and process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1989-03-29 EP disclosed