Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRNB2 | P17787 | 1/20 | 0.40 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.40 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.40 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.40 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.32 |
| ▸ | EPAS1 | Q99814 | 2/20 | 0.32 |
| ▸ | TAS1R3 | Q7RTX0 | 1/20 | 0.31 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16537134 | 0.77 | CHRNB2 (0.40) | CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4 | |
| SCHEMBL16536866 | 0.75 | ALDH1A1 (0.39) | CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4 | |
| SCHEMBL5351296 | 0.75 | CHRNB2 (0.42) | CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4 | |
| SCHEMBL16537193 | 0.74 | CHRNB2 (0.40) | CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4 | |
| SCHEMBL6329936 | 0.73 | ALDH1A1 (0.38) | CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4 | |
| SCHEMBL16537732 | 0.73 | CHRNB2 (0.39) | CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4 | |
| SCHEMBL5888525 | 0.73 | CHRNB2 (0.44) | CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4 | |
| SCHEMBL8528241 | 0.71 | ALDH1A1 (0.39) | CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4 | |
| SCHEMBL6694154 | 0.71 | CHRNB2 (0.40) | CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4 | |
| SCHEMBL6692508 | 0.70 | CHRNB2 (0.39) | CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5683857-A | Method for forming resist pattern by irradiating a resist coating on a substrate, contacting the resist with organic solvent vapor and removing the irradiated portion | NIPPON PAINT CO., LTD. (JP) | 1997-11-04 | — | — | US | disclosed |
| EP-0626620-B1 | Method for forming resist pattern | NIPPON PAINT CO LTD (JP) | 1996-10-09 | — | — | EP | disclosed |
| EP-0626620-A1 | Method for forming resist pattern | Nippon Paint Co., Ltd. (JP) | 1994-11-30 | — | — | EP | disclosed |