Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 3/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.52 |
| ▸ | MAPT | P10636 | 1/20 | 0.52 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | RAB9A | P51151 | 2/20 | 0.46 |
| ▸ | NPC1 | O15118 | 1/20 | 0.46 |
| ▸ | LSS | P48449 | 8/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.43 |
| ▸ | CHKA | P35790 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1521415 | 0.93 | RAB9A (0.58) | HPGDALDH1A1MAPTLMNARAB9A | |
| SCHEMBL9640200 | 0.90 | HPGD (0.43) | HPGDALDH1A1MAPTLMNARAB9A | |
| SCHEMBL11391579 | 0.88 | HPGD (0.44) | HPGDALDH1A1MAPTLMNARAB9A | |
| SCHEMBL250420 | 0.86 | TSHR (0.46) | ALDH1A1RAB9ANPC1SMN1; SMN2PTPN1 | |
| SCHEMBL4564604 | 0.85 | MAPT (0.50) | HPGDALDH1A1MAPTLMNARAB9A | |
| SCHEMBL5950655 | 0.85 | KDM4E (0.47) | HPGDALDH1A1MAPTRAB9ASMN1; SMN2 | |
| SCHEMBL851567 | 0.82 | CHKA (0.50) | ALDH1A1SMN1; SMN2PTPN1CHKATSHR | |
| SCHEMBL11399468 | 0.82 | AKR1C3 (0.54) | HPGDALDH1A1LMNARAB9ANPC1 | |
| SCHEMBL8999586 | 0.82 | LIG1 (0.54) | HPGDALDH1A1MAPTLMNARAB9A | |
| SCHEMBL8582159 | 0.82 | HPGD (0.40) | HPGDALDH1A1MAPTLMNARAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 689 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080138743-A1 | Laser sensitive lithographic printing plate having specific photopolymer composition | TENG GARY GANGHUI | 2008-06-12 | — | — | US | claimed |
| US-20080118869-A1 | Laser sensitive lithographic printing plate having specific photopolymer composition | TENG GARY G | 2008-05-22 | — | — | US | claimed |
| US-7348132-B2 | Laser sensitive lithographic printing plate having specific photopolymer composition | TENG GARY GANGHUI | 2008-03-25 | — | — | US | claimed |
| EP-0890587-B1 | Amine-initiated elastomers having a hysteresis reducing interaction with silica | BRIDGESTONE CORP (JP) | 2008-03-05 | — | — | EP | claimed |
| US-20070172765-A1 | Laser sensitive lithographic printing plate having specific photopolymer composition | TENG GARY G | 2007-07-26 | — | — | US | claimed |
| US-20060084176-A1 | Detection of uronium salts | YISSUM RESEARCH DEVELOPMENT COMPANY OF THE HEBREW UNIVERSITY OF JERUSALEM (IL) | 2006-04-20 | — | — | US | claimed |
| EP-0890586-B1 | Composition of cyclic amine-initiated elastomers and silica and process for the production thereof | BRIDGESTONE CORP (JP) | 2004-09-15 | — | — | EP | claimed |
| US-5916961-A | AMINE-CONTAINING LITHIUM INITIATOR, AMINE TERMINATING AGENT, AMINE FUNCTIONIZED POLYMER | BRIDGESTONE CORPORATION (JP) | 1999-06-29 | — | — | US | claimed |
| US-5866650-A | Composition of cyclic amine-initiated elastomers and amorphous silica and process for the production thereof | BRIDGESTONE CORPORATION (JP) | 1999-02-02 | — | — | US | claimed |
| EP-0890587-A1 | Amine-initiated elastomers having a hysteresis reducing interaction with silica | Bridgestone Corporation (JP) | 1999-01-13 | — | — | EP | claimed |
| EP-0890586-A1 | Composition of cyclic amine-initiated elastomers and silica and process for the production thereof | Bridgestone Corporation (JP) | 1999-01-13 | — | — | EP | claimed |
| US-5576138-A | MIXTURE OF RESIN, PHOTOSENSITIZER AND BENZOPHENONE COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-11-19 | — | — | US | claimed |
| US-5478692-A | Fine patterning for electronics | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-12-26 | — | — | US | claimed |
| US-5030548-A | Photoiniator system comprising a 4,4'-bis(dialkylamino) benzophenone, an aromatic ketone and lophine dimer; also present a halogen compound leuco and dye; lithography; printing plates; photoresists | FUJI PHOTO FILM CO., LTD. (JP) | 1991-07-09 | — | — | US | claimed |
| EP-0137228-B1 | PHOTOPOLYMERIZABLE COMPOSITION | FUJI PHOTO FILM CO., LTD. (JP) | 1988-10-05 | — | — | EP | claimed |
| US-4661434-A | PHOTORESISTS | FUJI PHOTO FILM CO., LTD. (JP) | 1987-04-28 | — | — | US | claimed |
| US-4548892-A | INITIATOR FOR ADDITION POLYMERS | FUJI PHOTO FILM CO., LTD. (JP) | 1985-10-22 | — | — | US | claimed |
| EP-0137228-A2 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1985-04-17 | — | — | EP | claimed |
| JP-7248621-A | — | — | None | — | — | JP | disclosed |
| JP-S06224240-A | — | — | 0001-01-01 | — | — | JP | disclosed |