SCHEMBL9640200

SCHEMBL9640200

C=CCN(CC=CO)c1ccc(C(=O)c2ccc(N(CC=C)CC=CO)cc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
HPGD P15428 3/20 0.43
ALDH1A1 P00352 2/20 0.43
MAPT P10636 1/20 0.43
PTPN1 P18031 2/20 0.41
LMNA P02545 1/20 0.40
LSS P48449 8/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
RAB9A P51151 2/20 0.39
NPC1 O15118 1/20 0.39
CHKA P35790 1/20 0.35
TSHR P16473 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL88637 0.90 HPGD (0.52) HPGDALDH1A1MAPTPTPN1LMNA
SCHEMBL1521415 0.83 RAB9A (0.58) HPGDALDH1A1MAPTLMNALSS
SCHEMBL7047586 0.80 CNR1 (0.41) ALDH1A1PTPN1LMNASMN1; SMN2CHKA
SCHEMBL9403801 0.80 ALDH1A1 (0.41) ALDH1A1MAPTPTPN1CHKATSHR
SCHEMBL11396360 0.80 CYP1A2 (0.41) ALDH1A1LMNASMN1; SMN2CHKATSHR
SCHEMBL7180172 0.79 SNCA (0.48) HPGDALDH1A1MAPTPTPN1SMN1; SMN2
SCHEMBL11391579 0.79 HPGD (0.44) HPGDALDH1A1MAPTPTPN1LMNA
SCHEMBL250420 0.78 TSHR (0.46) ALDH1A1PTPN1SMN1; SMN2RAB9ANPC1
SCHEMBL8582159 0.77 HPGD (0.40) HPGDALDH1A1MAPTPTPN1LMNA
SCHEMBL4564604 0.76 MAPT (0.50) HPGDALDH1A1MAPTPTPN1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0331007-B1 LIGHT-SENSITIVE RECORDING MATERIALS FOR THE MANUFACTURE OF SCRATCH-RESISTANT INTAGLIO PRINTING FORMES BASF Aktiengesellschaft (DE) 1992-09-02 EP disclosed
US-4994348-A Light-sensitive recording materials for producing mar-resistant intaglio printing plates BASF AKTIENGESELLSCHAFT (DE) 1991-02-19 US disclosed
EP-0331007-A2 Light-sensitive recording materials for the manufacture of scratch-resistant intaglio printing formes BASF Aktiengesellschaft (DE) 1989-09-06 EP disclosed
US-4550072-A Photosensitive recording materials containing particles for the production of abrasion-resistant gravure printing plates, and the production of gravure printing plates using these recording materials BASF AKTIENGESELLSCHAFT (DE) 1985-10-29 US disclosed
US-4548894-A Photosensitive recording materials for the production of abrasion-resistant and scratch-resistant gravure printing plates comprising particles BASF AKTIENGESELLSCHAFT (DE) 1985-10-22 US disclosed
EP-0070511-A1 Photosensible recording materials for the production of intaglio printing forms resistant to abrasion and being scratchproof, and method of producing intaglio printing forms utilizing these recording materials BASF Aktiengesellschaft (DE) 1983-01-26 EP disclosed