Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOA | P21397 | 3/20 | 0.57 |
| ▸ | CES1 | P23141 | 3/20 | 0.53 |
| ▸ | BCHE | P06276 | 2/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.46 |
| ▸ | MIF | P14174 | 3/20 | 0.43 |
| ▸ | MAOB | P27338 | 1/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.42 |
| ▸ | MEN1 | O00255 | 2/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.42 |
| ▸ | TDP2 | O95551 | 2/20 | 0.40 |
| ▸ | ACHE | P22303 | 1/20 | 0.40 |
| ▸ | CASP3 | P42574 | 1/20 | 0.40 |
| ▸ | CASP7 | P55210 | 1/20 | 0.40 |
| ▸ | CASP9 | P55211 | 1/20 | 0.40 |
| ▸ | CASP6 | P55212 | 1/20 | 0.40 |
| ▸ | CASP8 | Q14790 | 1/20 | 0.40 |
| ▸ | MAP3K14 | Q99558 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 3/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30311915 | 1.00 | MAOA (0.57) | MAOACES1BCHEALDH1A1CYP1A2 | |
| SCHEMBL17144667 | 0.94 | MAOA (0.59) | MAOACES1BCHEALDH1A1CYP1A2 | |
| SCHEMBL2319027 | 0.79 | MAOA (0.90) | MAOACES1BCHEALDH1A1CYP1A2 | |
| SCHEMBL8719618 | 0.78 | MAOA (0.41) | MAOACES1BCHEALDH1A1CYP1A2 | |
| SCHEMBL3697039 | 0.77 | CES1 (0.63) | MAOACES1BCHEALDH1A1MIF | |
| SCHEMBL26761 | 0.74 | MEN1 (0.42) | MAOACES1BCHEALDH1A1CYP1A2 | |
| SCHEMBL9550880 | 0.74 | MAOA (0.40) | MAOACES1BCHEALDH1A1CYP1A2 | |
| Anthrone SCHEMBL18143 | 0.74 | MAOA (1.00) | MAOACES1BCHEALDH1A1CYP1A2 | |
| Anthrone SCHEMBL1527782 | 0.74 | MAOA (1.00) | MAOACES1BCHEALDH1A1CYP1A2 | |
| Anthrone SCHEMBL29357010 | 0.74 | MAOA (1.00) | MAOACES1BCHEALDH1A1CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 291 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115951559-A | Photosensitive resin composition, preparation method thereof, cured film and application thereof | 福建泓光半导体材料有限公司 | 2023-04-11 | — | — | CN | claimed |
| CN-115850907-A | Phenolic resin composition, preparation method and application thereof, and preparation method of solidified relief pattern | 福建泓光半导体材料有限公司 | 2023-03-28 | — | — | CN | claimed |
| US-11347148-B2 | Patterning method and method for manufacturing array substrate | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2022-05-31 | — | — | US | claimed |
| US-20210200090-A1 | Patterning Method and Method for Manufacturing Array Substrate | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2021-07-01 | — | — | US | claimed |
| EP-3307553-A1 | SECURITY DEVICES AND METHODS OF MANUFACTURE THEREOF | De La Rue International Limited (GB) | 2018-04-18 | — | — | EP | claimed |
| US-8609323-B2 | System for producing patterned silicon carbide structures | UNIVERSITY OF MASSACHUSETTS (US) | 2013-12-17 | — | — | US | claimed |
| US-20120321854-A1 | System For Producing Patterned Silicon Carbide Structures | UNIVERSITY OF MASSACHUSETTS (US) | 2012-12-20 | — | — | US | claimed |
| WO-2011068884-A2 | A SYSTEM FOR PRODUCING PATTERNED SILICON CARBIDE STRUCTURES | UNIVERSITY OF MASSACHUSETTS (US) | 2011-06-09 | — | — | WO | claimed |
| US-20090111050-A1 | Novel Photosensitive Resin Compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2009-04-30 | — | — | US | claimed |
| WO-2009052177-A1 | NOVEL PHOTOSENSITIVE RESIN COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2009-04-23 | — | — | WO | claimed |
| US-7019093-B2 | Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance | DOW GLOBAL TECHNOLOGIES INC. (US) | 2006-03-28 | — | — | US | claimed |
| WO-2006031603-A2 | PROCESS FOR MAKING A MICRO-FLUID EJECTION HEAD STRUCTURE | LEXMARK INTERNATIONAL, INC. (US) | 2006-03-23 | — | — | WO | claimed |
| US-20060057503-A1 | Process for making a micro-fluid ejection head structure | BRADY WORLDWIDE, INC. | 2006-03-16 | — | — | US | claimed |
| WO-2004038505-A1 | AQUEOUS DEVELOPABLE, PHOTOSENSITIVE BENZOCYCLOBUTENE-BASED OLIGOMERS AND POLYMERS WITH HIGH MOISTURE RESISTANCE | DOW GLOBAL TECHNOLOGIES INC. (US) | 2004-05-06 | — | — | WO | claimed |
| US-20040076911-A1 | Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance | DOW GLOBAL TECHNOLOGIES LLC | 2004-04-22 | — | — | US | claimed |
| EP-0824719-B1 | A PROCESS FOR OBTAINING A LIFT-OFF IMAGING PROFILE | CLARIANT FINANCE BVI LTD (VG) | 2001-12-05 | — | — | EP | claimed |
| US-5922503-A | Process for obtaining a lift-off imaging profile | CLARIANT FINANCE (BVI) LIMITED (VG) | 1999-07-13 | — | — | US | claimed |
| EP-0824719-A1 | A PROCESS FOR OBTAINING A LIFT-OFF IMAGING PROFILE | CLARIANT INTERNATIONAL LTD. (CH) | 1998-02-25 | — | — | EP | claimed |
| WO-1997033199-A1 | A PROCESS FOR OBTAINING A LIFT-OFF IMAGING PROFILE | CLARIANT INTERNATIONAL, LTD. (CH) | 1997-09-12 | — | — | WO | claimed |
| EP-0184553-B1 | MODIFIED PHENOLIC RESINS AND THEIR FABRICATION | CIBA-GEIGY AG (CH) | 1991-07-31 | — | — | EP | claimed |