Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 3/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.42 |
| ▸ | CDC25B | P30305 | 3/20 | 0.42 |
| ▸ | MAOA | P21397 | 4/20 | 0.41 |
| ▸ | S100A4 | P26447 | 4/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.41 |
| ▸ | CES1 | P23141 | 3/20 | 0.41 |
| ▸ | APAF1 | O14727 | 3/20 | 0.41 |
| ▸ | POLB | P06746 | 3/20 | 0.41 |
| ▸ | MAPT | P10636 | 3/20 | 0.41 |
| ▸ | RAB9A | P51151 | 3/20 | 0.41 |
| ▸ | BCHE | P06276 | 2/20 | 0.41 |
| ▸ | TDP2 | O95551 | 2/20 | 0.41 |
| ▸ | LMNA | P02545 | 2/20 | 0.41 |
| ▸ | BLM | P54132 | 2/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | CES2 | O00748 | 1/20 | 0.41 |
| ▸ | TERT | O14746 | 1/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | PLIN1 | O60240 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29530894 | 0.98 | MEN1 (0.41) | MEN1KMT2ACDC25BMAOAS100A4 | |
| Hydrochloric Acid SCHEMBL7597249 | 0.98 | MEN1 (0.41) | MEN1KMT2ACDC25BMAOAS100A4 | |
| Sulfuric Acid SCHEMBL3680446 | 0.93 | MEN1 (0.37) | MEN1KMT2ACDC25BMAOAS100A4 | |
| SCHEMBL3273520 | 0.93 | MEN1 (0.37) | MEN1KMT2ACDC25BMAOAS100A4 | |
| SCHEMBL4895477 | 0.93 | MEN1 (0.37) | MEN1KMT2ACDC25BMAOAS100A4 | |
| Naphthoquinone SCHEMBL28299526 | 0.91 | IDO1 (0.47) | MEN1KMT2ACDC25BMAOAS100A4 | |
| Phenol SCHEMBL28798223 | 0.90 | APAF1 (0.38) | MEN1KMT2ACDC25BMAOAKDM4E | |
| SCHEMBL5698405 | 0.90 | MEN1 (0.34) | MEN1KMT2ACDC25BMAOAS100A4 | |
| SCHEMBL28905967 | 0.88 | CES1 (0.39) | MEN1KMT2ACDC25BMAOAS100A4 | |
| Benzophenone SCHEMBL28692346 | 0.87 | ALDH1A1 (0.42) | MEN1KMT2ACDC25BKDM4EAPAF1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 6803 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122080368-A | Photosensitive resin, preparation method thereof and photosensitive resin composition | — | 2026-05-26 | — | — | CN | claimed |
| CN-122085595-A | Colored photosensitive resin composition and application thereof | — | 2026-05-26 | — | — | CN | claimed |
| CN-122085594-A | Positive coloring photosensitive composition and application thereof | — | 2026-05-26 | — | — | CN | claimed |
| US-12619149-B2 | DNQ-free chemically amplified resist composition | MERCK PATENT GMBH (DE) | 2026-05-05 | — | — | US | claimed |
| US-20260110963-A1 | PHOTORESIST COMPOSITION, PATTERN FORMING METHOD USING NEAR-FIELD SURFACE LAYER IMAGING, AND DEPOSITION DEVICE | INST OPTICS & ELECTRONICS CAS (CN) | 2026-04-23 | — | — | US | claimed |
| US-20260095143-A1 | SAW DEVICE HAVING MULTIPLE FILTER BANDS AND METHOD FOR MANUFACTURING THE SAME | WISOL CO LTD (KR) | 2026-04-02 | — | — | US | claimed |
| US-20260093176-A1 | ELECTROACTIVE COMPOUNDS, COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) | 2026-04-02 | — | — | US | claimed |
| US-12570872-B2 | Acrylic polymerized polysiloxane, composition comprising the same, and cured film produced using the same | MERCK PATENT GMBH (DE) | 2026-03-10 | — | — | US | claimed |
| US-20260047474-A1 | SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-02-12 | — | — | US | claimed |
| EP-4684416-A1 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SEMICONDUCTOR DEVICE | Friedrich-Schiller-Universität Jena (DE) | 2026-01-28 | — | — | EP | claimed |
| EP-0126266-B1 | LOW STRIATION POSITIVE RESIST COMPOSITION | MicroSi, Inc. (a Delaware corporation) (US) | 1990-03-21 | — | — | EP | claimed |
| US-4904564-A | PHENOLIC-FORMALDEHYDE NOVOLAK; DIAZO SENSITIZER; IMIDAZOLE, BENZIMIDAZOLE, TRIAZOLE OR INDAZOLE TO INCREASE SOLUBILITY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1990-02-27 | — | — | US | claimed |
| EP-0346650-A2 | Process for imaging multi-layer resist structure | International Business Machines Corporation (US) | 1989-12-20 | — | — | EP | claimed |
| EP-0342737-A1 | Method of manufacturing a semi-conductor device | Koninklijke Philips Electronics N.V. (NL) | 1989-11-23 | — | — | EP | claimed |
| EP-0195315-B1 | PROCESS FOR THE PRODUCTION OF PHOTORESIST PATTERNS | HOECHST CELANESE CORPORATION (US) | 1989-10-25 | — | — | EP | claimed |
| EP-0154979-B1 | SINGLE DEVELOPMENT STEP, DUAL LAYER PHOTORESIST PHOTOLITHOGRAPHIC PROCESS | International Business Machines Corporation (US) | 1989-09-13 | — | — | EP | claimed |
| US-4810613-A | Blocked monomer and polymers therefrom for use as photoresists | HOECHST CELANESE CORPORATION (US) | 1989-03-07 | — | — | US | claimed |
| EP-0281182-A1 | Method of manufacturing a semiconductor arrangement | Koninklijke Philips Electronics N.V. (NL) | 1988-09-07 | — | — | EP | claimed |
| US-4567132-A | Multi-level resist image reversal lithography process | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1986-01-28 | — | — | US | claimed |
| EP-0154979-A2 | Single development step, dual layer photoresist photolithographic process | International Business Machines Corporation (US) | 1985-09-18 | — | — | EP | claimed |