Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.58 |
| ▸ | TSHR | P16473 | 5/20 | 0.58 |
| ▸ | MEN1 | O00255 | 2/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.46 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.41 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.41 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.41 |
| ▸ | PGR | P06401 | 1/20 | 0.41 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.41 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.41 |
| ▸ | HTR1A | P08908 | 1/20 | 0.41 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.41 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.41 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.41 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.41 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.41 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | CHRNA10 | Q9GZZ6 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methoxymethane SCHEMBL3381489 | 1.00 | ALDH1A1 (0.58) | ALDH1A1TSHRMEN1KMT2AMAPK1 | |
| Methoxymethane SCHEMBL1401430 | 1.00 | ALDH1A1 (0.58) | ALDH1A1TSHRMEN1KMT2AMAPK1 | |
| SCHEMBL10348237 | 0.95 | ALDH1A1 (0.62) | ALDH1A1TSHRMEN1KMT2AMAPK1 | |
| Di(Hydroxyethyl)Ether SCHEMBL4528966 | 0.95 | ALDH1A1 (0.62) | ALDH1A1TSHRMEN1KMT2AMAPK1 | |
| SCHEMBL19077690 | 0.95 | ALDH1A1 (0.62) | ALDH1A1TSHRMEN1KMT2AMAPK1 | |
| SCHEMBL310500 | 0.95 | ALDH1A1 (0.62) | ALDH1A1TSHRMEN1KMT2AMAPK1 | |
| SCHEMBL14097232 | 0.95 | ALDH1A1 (0.62) | ALDH1A1TSHRMEN1KMT2AMAPK1 | |
| SCHEMBL11512439 | 0.95 | ALDH1A1 (0.62) | ALDH1A1TSHRMEN1KMT2AMAPK1 | |
| SCHEMBL994878 | 0.95 | ALDH1A1 (0.62) | ALDH1A1TSHRMEN1KMT2AMAPK1 | |
| Tetraethylene Glycol SCHEMBL7551970 | 0.95 | ALDH1A1 (0.62) | ALDH1A1TSHRMEN1KMT2AMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 261 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3140263-B1 | BINDER, ADHESIVE AND ACTIVE FILLER SYSTEM FOR THREE-DIMENSIONAL PRINTING OF CERAMICS | 3DBOTICS INC (US) | 2020-02-19 | — | — | EP | claimed |
| US-10399363-B2 | Print method, ink set, and inkjet print device | RICOH COMPANY, LTD. (JP) | 2019-09-03 | — | — | US | claimed |
| US-8492066-B2 | Toner compositions and processes | XEROX CORPORATION (US) | 2013-07-23 | — | — | US | claimed |
| US-20120244470-A1 | TONER COMPOSITIONS AND PROCESSES | XEROX CORPORATION (US) | 2012-09-27 | — | — | US | claimed |
| US-7736831-B2 | Emulsion/aggregation process using coalescent aid agents | XEROX CORPORATION (US) | 2010-06-15 | — | — | US | claimed |
| US-20080063965-A1 | Emulsion/aggregation processes using coalescent aid agents | XEROX CORPORATION (US) | 2008-03-13 | — | — | US | claimed |
| US-20260118751-A1 | ORGANOMETALLIC COMPOUND, RESIST COMPOSITION COMPRISING THE SAME, AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-04-30 | — | — | US | disclosed |
| US-20260093178-A1 | POLYMER, METHOD OF PRODUCING THE SAME, RESIST COMPOSITION INCLUDING THE POLYMER, AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-04-02 | — | — | US | disclosed |
| US-12577401-B2 | Curable resin composition, cured film formed therefrom, and electronic device having cured film | SAMSUNG SDI CO., LTD. (KR) | 2026-03-17 | — | — | US | disclosed |
| US-20250333554-A1 | POLYMER, RESIST COMPOSITION COMPRISING THE SAME AND PATTERN FORMATION METHOD USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-10-30 | — | — | US | disclosed |
| US-20250123563-A1 | POLYMER, RESIST COMPOSITION COMPRISING THE SAME AND METHOD OF FORMING PATTERN USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-04-17 | — | — | US | disclosed |
| US-20250102906-A1 | ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-03-27 | — | — | US | disclosed |
| US-20250021003-A1 | POLYMER, MONOMER, RESIST COMPOSITION COMPRISING THE SAME AND METHOD OF FORMING PATTERN USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-01-16 | — | — | US | disclosed |
| US-4973992-A | TANK OF RESIN OR SYNTHETIC RUBBER CONTAINING FATTY ACID OR DERIVATIVE | SEIKO EPSON CORPORATION (JP) | 1990-11-27 | — | — | US | disclosed |
| US-4869825-A | POLYCHLORINATED BIPHENYLS FROM SOILS, SEDIMENTS AND SLUDGES | STEINER WERNER (US) | 1989-09-26 | — | — | US | disclosed |
| US-4849773-A | PLASTIC TANKS WITH AQUEOUS INK CONTAINING SODIUM COMPOUND | SEIKO EPSON CORPORATION, A JAPANESE CORPORATION (JP) | 1989-07-18 | — | — | US | disclosed |
| US-4388238-A | FROM PRIMARY AMINES, ALCOHOLS, AND CARBONYL COMPOUNDS | BAYER AKTIENGESELLSCHAFT (DE) | 1983-06-14 | — | — | US | disclosed |
| US-4267260-A | Developer for lithographic printing plate | MITSUBISHI CHEMICAL INDUSTRIES, LTD. (JP) | 1981-05-12 | — | — | US | disclosed |
| US-4210412-A | POLYALKYLENE GLYCOL SWELLING AGENT AND SUBLIMABLE DISPERSE DYE | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 1980-07-01 | — | — | US | disclosed |
| US-4136068-A | CELLULOSE ESTER GRAFT POLYMER/ACRYLIC CO-POLYMER/AMINO RESIN WATER DISPERSIBLE COATING COMPOSITION | NIPPON OIL AND FATS COMPANY, LIMITED (JP) | 1979-01-23 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250102906-A1 | ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION | PRMT1, RER1, RCOR1 | ALDH1A1 1815/4885TSHR 4096/4885MEN1 4/4885 |
| US-20260093178-A1 | POLYMER, METHOD OF PRODUCING THE SAME, RESIST COMPOSITION INCLUDING THE POLYMER, AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION | RPS21, CA11, RPL21 | ALDH1A1 1875/4885TSHR 1950/4885MEN1 2854/4885 |
| US-12577401-B2 | Curable resin composition, cured film formed therefrom, and electronic device having cured film | SEM1, CARM1, CAD | ALDH1A1 1948/4885TSHR 4032/4885MEN1 3007/4885 |
| US-20260118751-A1 | ORGANOMETALLIC COMPOUND, RESIST COMPOSITION COMPRISING THE SAME, AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION | LBR, RER1, MNS1 | ALDH1A1 3752/4885TSHR 206/4885MEN1 652/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.