SCHEMBL8897512

SCHEMBL8897512

Cc1cc(COc2cccc(OCc3cc(C)c(O)c(C)c3)c2O)cc(C)c1O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.47
L3MBTL1 Q9Y468 2/20 0.47
MAPK1 P28482 1/20 0.47
TDP1 Q9NUW8 1/20 0.47
PTGS1 P23219 2/20 0.44
PTGS2 P35354 2/20 0.44
RXRA P19793 3/20 0.42
RXRB P28702 2/20 0.41
RXRG P48443 1/20 0.41
ALDH1A1 P00352 2/20 0.41
MRGPRX4 Q96LA9 3/20 0.41
FFAR4 Q5NUL3 3/20 0.41
LMNA P02545 1/20 0.41
RAB9A P51151 1/20 0.41
FFAR1 O14842 1/20 0.40
PPARA Q07869 1/20 0.40
KDM4E B2RXH2 1/20 0.40
HPGD P15428 1/20 0.40
ALOX15 P16050 1/20 0.40
BACE1 P56817 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7510928 0.93 MAPT (0.46) MAPTL3MBTL1MAPK1TDP1PTGS1
SCHEMBL8896923 0.81 ABCB1 (0.51) MAPTMAPK1RXRAALDH1A1MRGPRX4
SCHEMBL28675369 0.79 APP (0.58) MAPTL3MBTL1MAPK1ALDH1A1RAB9A
SCHEMBL14518225 0.78 LMNA (0.53) MAPTL3MBTL1PTGS1PTGS2ALDH1A1
SCHEMBL7098373 0.77 KDM4E (0.58) MAPTMAPK1ALDH1A1MRGPRX4LMNA
SCHEMBL8497192 0.76 MAPT (0.65) MAPTL3MBTL1MAPK1TDP1PTGS1
SCHEMBL11643569 0.76 MAPT (0.64) MAPTL3MBTL1MAPK1TDP1PTGS1
SCHEMBL10422129 0.74 RXRA (0.59) MAPTL3MBTL1TDP1RXRARXRB
SCHEMBL8377055 0.73 CA1 (0.48) MAPTL3MBTL1PTGS1PTGS2ALDH1A1
SCHEMBL2356383 0.73 APP (0.57) MAPTRXRAALDH1A1MRGPRX4RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5601961-A QUINONE DIAZIDE GROUP-CONTAINING COMPOUND AS PHOTOSENSITIZING AGENT, ALKALI-SOLUBLE RESINOUS INGREDIENT AS FILM-FORMING AGENT MADE FROM A BLEND OF AT LEAST TWO NOVOLAK-TYPE RESINS FROM M-AND P-CRESOL, A XYLENOL AND A TRIMETHYLPHENOL TOKYO OHKA KOGYO CO., LTD. (JP) 1997-02-11 US disclosed
US-5576138-A MIXTURE OF RESIN, PHOTOSENSITIZER AND BENZOPHENONE COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 1996-11-19 US disclosed