Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 2/20 | 0.46 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.44 |
| ▸ | NAAA | Q02083 | 2/20 | 0.42 |
| ▸ | HTT | P42858 | 4/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.35 |
| ▸ | NPC1 | O15118 | 1/20 | 0.35 |
| ▸ | RAB9A | P51151 | 1/20 | 0.35 |
| ▸ | CHRM3 | P20309 | 5/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.33 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.33 |
| ▸ | HRH1 | P35367 | 2/20 | 0.33 |
| ▸ | KCNH2 | Q12809 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | MLNR | O43193 | 1/20 | 0.33 |
| ▸ | HTR2A | P28223 | 1/20 | 0.33 |
| ▸ | HTR2C | P28335 | 1/20 | 0.33 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.33 |
| ▸ | DRD3 | P35462 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6898166 | 0.91 | CYP19A1 (0.47) | EPHX1CYP19A1NAAAHTTCYP2C19 | |
| SCHEMBL14725806 | 0.91 | EPHX1 (0.50) | EPHX1CYP19A1NAAAHTTCYP2C19 | |
| SCHEMBL21677330 | 0.85 | NAAA (0.45) | EPHX1CYP19A1NAAAHTTCYP2C19 | |
| SCHEMBL9945799 | 0.85 | CHRM3 (0.32) | EPHX1CYP19A1HTTSMN1; SMN2NPC1 | |
| SCHEMBL8980126 | 0.83 | NAAA (0.47) | EPHX1CYP19A1NAAAHTTCYP2C19 | |
| SCHEMBL16200778 | 0.83 | EPHX1 (0.44) | EPHX1CYP19A1NAAAHTTCYP2C19 | |
| SCHEMBL11957261 | 0.82 | EPHX1 (0.38) | EPHX1CYP19A1NAAAHTTCYP2C19 | |
| SCHEMBL12801056 | 0.82 | EPHX1 (0.42) | EPHX1CYP19A1NAAAHTTCYP2C19 | |
| SCHEMBL18233434 | 0.81 | EPHX1 (0.41) | EPHX1CYP19A1NAAAHTTCYP2C19 | |
| SCHEMBL131168 | 0.81 | EPHX1 (0.41) | EPHX1CYP19A1NAAAHTTCYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9897922-B2 | Method of forming pattern and developer for use in the method | FUJIFILM CORPORATION (JP) | 2018-02-20 | — | — | US | disclosed |
| US-20170102618-A1 | METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2017-04-13 | — | — | US | disclosed |
| US-20160349620-A1 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2016-12-01 | — | — | US | disclosed |
| US-9482958-B2 | Method of forming pattern and developer for use in the method | FUJIFILM CORPORATION (JP) | 2016-11-01 | — | — | US | disclosed |
| US-9223219-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film | FUJIFILM CORPORATION (JP) | 2015-12-29 | — | — | US | disclosed |
| US-20150293454-A1 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2015-10-15 | — | — | US | disclosed |
| US-9097973-B2 | Method of forming pattern and developer for use in the method | FUJIFILM CORPORATION (JP) | 2015-08-04 | — | — | US | disclosed |
| US-9046773-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound | FUJIFILM CORPORATION (JP) | 2015-06-02 | — | — | US | disclosed |
| US-9040219-B2 | Image forming material, planographic printing plate precursor, and method for manufacturing a planographic printing plate | FUJIFILM CORPORATION (JP) | 2015-05-26 | — | — | US | disclosed |
| US-9032876-B2 | Lithographic printing plate precursor, lithographic printing plate platemaking method, and polymerizable monomer | FUJIFILM CORPORATION (JP) | 2015-05-19 | — | — | US | disclosed |
| US-20090246695-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE SAME, POLYMERIZABLE COMPOUND AND POLYMER COMPOUND OBTAINED BY POLYMERIZING THE POLYMERIZABLE COMPOUND | FUJIFILM CORPORATION (JP) | 2009-10-01 | — | — | US | disclosed |
| US-7445882-B2 | Image recording material | FUJIFILM CORPORTATION (JP) | 2008-11-04 | — | — | US | disclosed |
| US-20080145782-A1 | IMAGE RECORDING MATERIAL AND NOVEL COMPOUND | FUJIFILM CORPORATION (JP) | 2008-06-19 | — | — | US | disclosed |
| US-20080081291-A1 | PHOTOPOLYMERIZATION TYPE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR | FUJIFILM CORPORATION (JP) | 2008-04-03 | — | — | US | disclosed |
| US-20080076066-A1 | PHOTOPOLYMERIZATION TYPE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR | FUJIFILM CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20080057439-A1 | Image recording material | FUJIFILM CORPORATION (JP) | 2008-03-06 | — | — | US | disclosed |
| US-20070298351-A1 | IMAGE RECORDING MATERIAL, PLANOGRAPHIC PRINTING PLATE PRECURSOR, AND PLANOGRAPHIC PRINTING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2007-12-27 | — | — | US | disclosed |
| US-20070287098-A1 | MEHTOD FOR PREPARATION OF LITHOGRAPHIC PRINTING PLATE AND LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2007-12-13 | — | — | US | disclosed |
| US-20070231740-A1 | A planographic printing plate precursor comprising: an aluminum support; and a photosensitive layer including a polymerization initiator, a polymerizable compound and a binder polymer; an oxygen barrier layer; and a protective layer including a filler; capable of image formation | FUJIFILM CORPORATION (JP) | 2007-10-04 | — | — | US | disclosed |
| US-20070048663-A1 | Photopolymerizable photosensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD. | 2007-03-01 | — | — | US | disclosed |