SCHEMBL9945799

SCHEMBL9945799

CCC(C)(CO)C(=O)OC1CCC(O)CC1

nearest known ligand 0.32

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRM3 P20309 2/20 0.32
MLNR O43193 1/20 0.32
CHRM2 P08172 1/20 0.32
CHRM1 P11229 1/20 0.32
HTR2A P28223 1/20 0.32
HTR2C P28335 1/20 0.32
HRH1 P35367 1/20 0.32
OPRM1 P35372 1/20 0.32
DRD3 P35462 1/20 0.32
OPRK1 P41145 1/20 0.32
HTR2B P41595 1/20 0.32
SLC6A3 Q01959 1/20 0.32
KCNH2 Q12809 1/20 0.32
CACNA1C Q13936 1/20 0.32
CYP19A1 P11511 1/20 0.31
EPHX1 P07099 1/20 0.31
SMN1; SMN2 Q16637 2/20 0.31
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
APOBEC3A P31941 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL889761 0.85 EPHX1 (0.46) CHRM3MLNRCHRM2CHRM1HTR2A
SCHEMBL25106642 0.83 MMP8 (0.36) CHRM3MLNRCHRM2CHRM1HTR2A
SCHEMBL2754858 0.81 CHRM3 (0.34) CHRM3MLNRCHRM2CHRM1HTR2A
SCHEMBL28296372 0.76 CYP19A1 (0.37) CHRM3CHRM2CHRM1CYP19A1SMN1; SMN2
SCHEMBL18373347 0.76 APOBEC3A (0.48) CHRM3MLNRCHRM2CHRM1HTR2A
SCHEMBL14725806 0.75 EPHX1 (0.50) CHRM3MLNRCHRM2CHRM1HTR2A
SCHEMBL6898166 0.75 CYP19A1 (0.47) CHRM3CYP19A1EPHX1SMN1; SMN2NPC1
SCHEMBL685924 0.73 CYP19A1 (0.35) CHRM3CHRM2CHRM1CYP19A1SMN1; SMN2
SCHEMBL3434648 0.72 EPHX1 (0.37) CHRM3MLNRCHRM2CHRM1HTR2A
SCHEMBL13345280 0.71 APOBEC3A (0.43) CHRM3MLNRCHRM2CHRM1HTR2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8999621-B2 Pattern forming method, chemical amplification resist composition and resist film FUJIFILM CORPORATION (JP) 2015-04-07 US disclosed
US-8808965-B2 Pattern forming method, pattern, chemical amplification resist composition and resist film FUJIFILM CORPORATION (JP) 2014-08-19 US disclosed
US-20120288691-A1 PATTERN FORMING METHOD, PATTERN, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2012-11-15 US disclosed
US-20120148957-A1 PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2012-06-14 US disclosed