Benzoic Acid

Benzoic Acid

SCHEMBL890408

C=CC(=O)O.O=C(O)c1ccccc1.OCCCC(CO)CO

nearest known ligand 0.42

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

CACNA1CCACNA1DCACNA1FCACNA1SDPP4HTR1BHTR1D

The experimentally established mechanism targets of Benzoic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.42
DAO P14920 1/20 0.42
NAPRT Q6XQN6 1/20 0.42
AKT1 P31749 1/20 0.41
CES2 O00748 1/20 0.38
CES1 P23141 1/20 0.38
SRD5A2 P31213 1/20 0.38
ALDH1A1 P00352 4/20 0.35
L3MBTL1 Q9Y468 3/20 0.35
OPRD1 P41143 1/20 0.34
PKM P14618 2/20 0.33
HDAC3 O15379 1/20 0.33
HDAC1 Q13547 1/20 0.33
HDAC2 Q92769 1/20 0.33
NCOR2 Q9Y618 1/20 0.33
LMNA P02545 2/20 0.33
MAPT P10636 2/20 0.33
TDP1 Q9NUW8 2/20 0.33
TP53 P04637 2/20 0.32
HPGD P15428 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzoic Acid SCHEMBL11436196 0.91 TSHR (0.52) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL505771 0.91 TSHR (0.52) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL235922 0.91 TSHR (0.52) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL2160785 0.88 TSHR (0.45) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL28085429 0.84 DAO (0.41) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL9894638 0.84 DAO (0.41) TSHRDAONAPRTCES2CES1
Terephthalic Acid SCHEMBL28441196 0.84 TSHR (0.48) TSHRDAONAPRTCES2CES1
Acrylic Acid SCHEMBL1344429 0.83 LMNA (0.43) TSHRALDH1A1LMNAALOX15HSD17B10
Acrylic Acid SCHEMBL22129646 0.83 LMNA (0.43) TSHRALDH1A1LMNAALOX15HSD17B10
Acrylic Acid SCHEMBL134218 0.83 LMNA (0.43) TSHRALDH1A1LMNAALOX15HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 202 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114656818-B metal oxide dispersion 凯斯科技股份有限公司 2023-11-17 CN claimed
US-10907023-B2 Polymer hollow particle, a method of preparing the same, and composite comprising the polymer hollow particle KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2021-02-02 US claimed
US-20190016868-A1 POLYMER HOLLOW PARTICLE, A METHOD OF PREPARING THE SAME, AND COMPOSITE COMPRISING THE POLYMER HOLLOW PARTICLE KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2019-01-17 US claimed
US-7879259-B2 thermoplastic resin and a styrene-acrylonitrile (SAN) copolymer resin, a curing composition, and conductive particles; exhibiting improved adhesion and low contact resistance characteristics CHEIL INDUSTRIES, INC. (KR) 2011-02-01 US claimed
US-20080099733-A1 Anisotropic conductive film composition CHEIL INDUSTRIES, INC. 2008-05-01 US claimed
CN-115698183-B Resin composition for wiring board material, and prepreg, resin-equipped film, resin-equipped metal foil, metal foil-clad laminate and wiring board using the resin composition 松下知识产权经营株式会社 2024-06-25 CN disclosed
CN-114656818-B metal oxide dispersion 凯斯科技股份有限公司 2023-11-17 CN disclosed
US-20230212392-A1 RESIN COMPOSITION FOR WIRING BOARD MATERIAL, AND PREPREG, RESIN-COATED FILM, RESIN-COATED METAL FOIL, METAL-CLAD LAMINATE, AND WIRING BOARD IN WHICH SAID RESIN COMPOSITION IS USED PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2023-07-06 US disclosed
CN-116200744-A Flexible copper-clad laminate film, method for producing same, and electrical element comprising same 东丽尖端素材株式会社 2023-06-02 CN disclosed
CN-115710438-A Metal oxide dispersion, thin film composition for display, and optical element for display 凯斯科技股份有限公司 2023-02-24 CN disclosed
CN-115702218-A Infrared-absorbing ultraviolet-curable ink and infrared-absorbing printed matter 共同印刷株式会社 2023-02-14 CN disclosed
CN-112384994-B Coated particles 日本化学工业株式会社 2022-10-04 CN disclosed
EP-1378794-A1 Light sensitive composition and light sensitive planographic printing plate precursor KONICA CORPORATION (JP) 2004-01-07 EP disclosed
US-20030194649-A1 Light sensitive compostion, light sensitive planographic printing plate precursor, and image formation method KONICA CORPORATION (JP) 2003-10-16 US disclosed
EP-1335247-A2 Light sensitive composition, light sensitive planographic printing plate precursor, and image formation method KONICA CORPORATION (JP) 2003-08-13 EP disclosed
US-20030113667-A1 Method of preparing planographic printing plate FUJIFILM CORPORATION (JP) 2003-06-19 US disclosed
US-6074741-A ROUGHENED SURFACE LAYER IS FORMED FROM AN ULTRAVIOLET CURING RESIN CONTAINING AT LEAST AN EPOXY COMPOUND AND A PHOTO-CATIONIC POLYMERIZATION INITIATOR, AND BEADS OF A CROSSLINKED ACRYLIC RESIN. TOMOEGAWA PAPER CO., LTD. (JP) 2000-06-13 US disclosed
EP-0762208-B1 Light sensitive composition KONISHIROKU PHOTO IND (JP) 2000-04-12 EP disclosed
US-5773194-A PHOTOSENSITIVITY; DURABILITY KONICA CORPORATION (JP) 1998-06-30 US disclosed
EP-0762208-A2 Light sensitive composition, presensitized lithographic printing plate and image forming method employing the printing plate KONICA CORPORATION (JP) 1997-03-12 EP disclosed