SCHEMBL8905305

SCHEMBL8905305

CC(C)(c1ccc(OC(=O)O)cc1)c1ccc(OC(=O)O)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.50
TDP1 Q9NUW8 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
ELANE P08246 8/20 0.47
KDM4E B2RXH2 3/20 0.45
POLB P06746 1/20 0.45
RAB9A P51151 3/20 0.45
MEN1 O00255 2/20 0.45
KMT2A Q03164 2/20 0.45
NPSR1 Q6W5P4 1/20 0.45
ESR1 P03372 2/20 0.44
CYP3A4 P08684 2/20 0.44
ESR2 Q92731 2/20 0.44
AR P10275 1/20 0.44
HPGD P15428 1/20 0.44
TSHR P16473 1/20 0.44
SLC6A2 P23975 1/20 0.44
SLC6A4 P31645 1/20 0.44
HTR6 P50406 1/20 0.44
ESRRG P62508 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4346502 1.00 MAPT (0.50) MAPTTDP1L3MBTL1ELANEKDM4E
SCHEMBL24385840 0.94 MAPT (0.59) MAPTTDP1L3MBTL1ELANEKDM4E
SCHEMBL1031672 0.94 TDP1 (0.54) MAPTTDP1L3MBTL1ELANEKDM4E
SCHEMBL253201 0.92 ESR1 (0.59) MAPTTDP1L3MBTL1ELANEKDM4E
SCHEMBL8862975 0.92 ESR1 (0.59) MAPTTDP1L3MBTL1ELANEKDM4E
SCHEMBL12289276 0.92 LMNA (0.57) MAPTTDP1L3MBTL1ELANEKDM4E
SCHEMBL17248001 0.92 MAPT (0.49) MAPTTDP1L3MBTL1KDM4ERAB9A
Bicarbonate SCHEMBL2404791 0.91 ESR1 (0.57) MAPTTDP1L3MBTL1ELANEKDM4E
SCHEMBL16405354 0.89 ELANE (0.45) MAPTTDP1L3MBTL1ELANEKDM4E
SCHEMBL4345285 0.89 ESR1 (0.55) MAPTTDP1L3MBTL1ELANEKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0465040-B1 Polyester polymer products ICI PLC (GB) 1997-01-15 EP claimed
US-20070275327-A1 PHOTOSENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMING METHOD, SUBSTRATE PROCESSING METHOD, AND DEVICE MANUFACTURING METHOD CANON KABUSHIKI KAISHA (JP) 2007-11-29 US disclosed