SCHEMBL8916711

SCHEMBL8916711

C=CC[CH]CS(=O)(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13610 0.77
SCHEMBL28973373 0.77 CA2 (0.33)
SCHEMBL7050624 0.76 CA5A (0.36)
Benzene SCHEMBL6408353 0.76 ALDH1A1 (0.35)
SCHEMBL27560469 0.76
SCHEMBL900195 0.75
Phosphine SCHEMBL3070415 0.75
SCHEMBL2547723 0.75
SCHEMBL29952 0.75
SCHEMBL2868065 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1427013-A Self-viscous cationic or amphoteric free-radical polymer and their use in cosmetics OREAL (FR) 2003-07-02 CN claimed
EP-0511540-B1 Water-soluble sulfoethyl ethers of cellulose with very good solubility and process for their preparation WOLFF WALSRODE AG (DE) 1996-07-10 EP claimed
CN-1427013-A Self-viscous cationic or amphoteric free-radical polymer and their use in cosmetics OREAL (FR) 2003-07-02 CN disclosed
US-5591844-A CONSTRUCTION MATERIALS HOECHST AKTIENGESELLSCHAFT (DE) 1997-01-07 US disclosed
US-5395930-A For plasters, adhesives or fillers and water retention HOECHST AG (DE) 1995-03-07 US disclosed