SCHEMBL8920726

SCHEMBL8920726

COc1ccccc1[S+](c1ccc(OC(C)(C)C)cc1)c1ccc(OC(C)(C)C)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.39
MAPK1 P28482 1/20 0.39
HTT P42858 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
CA1 P00915 3/20 0.38
CA2 P00918 3/20 0.38
CA7 P43166 2/20 0.38
CA9 Q16790 2/20 0.38
CA12 O43570 1/20 0.38
CA4 P22748 1/20 0.38
CA14 Q9ULX7 1/20 0.38
MAPT P10636 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
ORAI1 Q96D31 1/20 0.33
ORAI2 Q96SN7 1/20 0.33
ORAI3 Q9BRQ5 1/20 0.33
KIF11 P52732 1/20 0.33
TP53 P04637 1/20 0.32
TSHR P16473 1/20 0.32
ADRA2B P18089 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL8493067 0.87 NPSR1 (0.34) ALDH1A1MAPK1HTTL3MBTL1CA1
SCHEMBL8498317 0.83 MAPT (0.36) ALDH1A1MAPK1HTTL3MBTL1MAPT
SCHEMBL3182804 0.81 KIF11 (0.38) ALDH1A1MAPK1HTTL3MBTL1CA1
SCHEMBL3203357 0.81 KIF11 (0.38) ALDH1A1MAPK1HTTL3MBTL1CA1
SCHEMBL2090403 0.79 CA1 (0.50) ALDH1A1MAPK1HTTL3MBTL1CA1
SCHEMBL31005134 0.79 CA1 (0.50) ALDH1A1MAPK1HTTL3MBTL1CA1
SCHEMBL246925 0.77 KIF11 (0.40) ALDH1A1MAPK1L3MBTL1CA4MAPT
SCHEMBL246587 0.77 KIF11 (0.40) ALDH1A1MAPK1L3MBTL1CA4MAPT
SCHEMBL245948 0.76 SLC6A2 (0.37) MAPTKIF11CYP1A2MEN1KMT2A
SCHEMBL3199523 0.76 CA1 (0.36) ALDH1A1MAPK1HTTL3MBTL1CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5624787-A NITROGENOUS COMPOUND AND SULFONIUM COMPOUND FOR POSITIVE PHOTORESISTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 1997-04-29 US claimed