Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KIF11 | P52732 | 1/20 | 0.40 |
| ▸ | ACACB | O00763 | 2/20 | 0.33 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.33 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.33 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.33 |
| ▸ | RIPK1 | Q13546 | 1/20 | 0.33 |
| ▸ | PPARA | Q07869 | 4/20 | 0.33 |
| ▸ | PPARG | P37231 | 4/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.32 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | LTA4H | P09960 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | PPARD | Q03181 | 1/20 | 0.31 |
| ▸ | CA4 | P22748 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL246925 | 1.00 | KIF11 (0.40) | KIF11ACACBSLC6A2SLC6A4SLC6A3 | |
| Bromide SCHEMBL1923006 | 0.98 | KIF11 (0.39) | KIF11ACACBSLC6A2SLC6A4SLC6A3 | |
| Hydrochloric Acid SCHEMBL482291 | 0.98 | KIF11 (0.39) | KIF11ACACBSLC6A2SLC6A4SLC6A3 | |
| Perchlorate SCHEMBL3141079 | 0.93 | KIF11 (0.36) | KIF11ACACBSLC6A2SLC6A4SLC6A3 | |
| SCHEMBL3139754 | 0.93 | KIF11 (0.36) | KIF11ACACBSLC6A2SLC6A4SLC6A3 | |
| SCHEMBL4640814 | 0.93 | KIF11 (0.36) | KIF11ACACBSLC6A2SLC6A4SLC6A3 | |
| SCHEMBL12228666 | 0.93 | KIF11 (0.36) | KIF11ACACBSLC6A2SLC6A4SLC6A3 | |
| SCHEMBL245948 | 0.91 | SLC6A2 (0.37) | KIF11ACACBSLC6A2SLC6A4SLC6A3 | |
| SCHEMBL3136242 | 0.89 | KIF11 (0.34) | KIF11 | |
| SCHEMBL5415682 | 0.89 | KIF11 (0.41) | KIF11RIPK1PPARAPPARGCYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1534 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4607278-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | Ycchem Co., Ltd. (KR) | 2025-08-27 | — | — | EP | claimed |
| US-20250199405-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | YCCHEM CO., LTD. (KR) | 2025-06-19 | — | — | US | claimed |
| WO-2024085293-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | 영창케미칼 주식회사 | 2024-04-25 | — | — | WO | claimed |
| US-9221928-B2 | Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-12-29 | — | — | US | claimed |
| US-9075306-B2 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-07 | — | — | US | claimed |
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | claimed |
| CN-101034260-B | Photosensitive resin composition | DONGJIN SEMICOHEM CO LTD | 2012-07-18 | — | — | CN | claimed |
| EP-1780199-B1 | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-02-01 | — | — | EP | claimed |
| EP-1780198-B1 | Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-10-05 | — | — | EP | claimed |
| CN-101034260-A | Photosensitive resin composition | DONGJIN SEMICHEM CO LTD (KR) | 2007-09-12 | — | — | CN | claimed |
| US-6440634-B1 | MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2002-08-27 | — | — | US | claimed |
| JP-10007650-A | — | — | None | — | — | JP | disclosed |
| JP-58128818-A | — | — | None | — | — | JP | disclosed |
| US-20260093177-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-02 | — | — | US | disclosed |
| US-12535737-B2 | Material for forming adhesive film, patterning process, and method for forming adhesive film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-27 | — | — | US | disclosed |
| US-4076697-A | FROM POLYIMIDES AND POLYCARBOXYLIC ACIDS IN THE PRESENCE OF AN AMINE | CIBA-GEIGY CORPORATION (US) | 1978-02-28 | — | — | US | disclosed |
| US-4060958-A | Method of manufacturing a packaging container | SEKISUI KASEIHIN KOGYO KABUSHIKI KAISHA (JA) | 1977-12-06 | — | — | US | disclosed |
| US-4038251-A | PROCESS FOR THE MANUFACTURE OF POLYADDITION PRODUCTS CONTAINING IMIDE GROUPS BY REACTION OF POLYMALEIMIDES WITH POLYHYDRIC PHENOLS USING AMINE CATALYST | CIBA-GEIGY CORPORATION (US) | 1977-07-26 | — | — | US | disclosed |
| US-3950279-A | DI- OR TRI-MALEIMIDE, AZOMETHINE, SOLID FOAMING AGENT | CIBA-GEIGY CORPORATION (US) | 1976-04-13 | — | — | US | disclosed |
| US-3947385-A | Mixtures containing prepolymers, which can be converted to heat-resistant foamed plastics | CIBA-GEIGY CORPORATION (US) | 1976-03-30 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260093177-A1 | PATTERNING PROCESS | ARFGAP1, ARF1, ARF4 | KIF11 3136/4885ACACB 2575/4885SLC6A2 4718/4885 |
| US-12535737-B2 | Material for forming adhesive film, patterning process, and method for forming adhesive film | RAD51, CDH1, SMC2 | KIF11 3000/4885ACACB 3309/4885SLC6A2 2462/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.