Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | OPRK1 | P41145 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | ACHE | P22303 | 1/20 | 0.43 |
| ▸ | ESR1 | P03372 | 5/20 | 0.43 |
| ▸ | ESR2 | Q92731 | 5/20 | 0.43 |
| ▸ | TLR8 | Q9NR97 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | GAA | P10253 | 3/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.41 |
| ▸ | GLA | P06280 | 2/20 | 0.41 |
| ▸ | HPGD | P15428 | 2/20 | 0.41 |
| ▸ | PKM | P14618 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 2/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.40 |
| ▸ | MAOB | P27338 | 2/20 | 0.40 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.40 |
| ▸ | MIF | P14174 | 1/20 | 0.40 |
| ▸ | TYR | P14679 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29771848 | 1.00 | OPRK1 (0.44) | OPRK1KMT2AACHEESR1ESR2 | |
| SCHEMBL9621794 | 0.91 | OPRK1 (0.44) | OPRK1KMT2AACHEESR1ESR2 | |
| SCHEMBL7783966 | 0.83 | IDO1 (0.50) | KMT2AESR1ESR2ALDH1A1KDM4E | |
| SCHEMBL28227630 | 0.82 | TP53 (0.56) | OPRK1KMT2AALDH1A1GAAKDM4E | |
| SCHEMBL11759642 | 0.82 | TP53 (0.56) | OPRK1KMT2AALDH1A1GAAKDM4E | |
| SCHEMBL6583934 | 0.78 | GLO1 (0.49) | ACHEALDH1A1GAAKDM4EGLA | |
| SCHEMBL30783551 | 0.78 | GLO1 (0.49) | ACHEALDH1A1GAAKDM4EGLA | |
| SCHEMBL20146604 | 0.78 | TRPA1 (0.46) | OPRK1KMT2AACHEESR1ESR2 | |
| SCHEMBL21985732 | 0.76 | ESR1 (0.50) | ACHEESR1ESR2TLR8ALDH1A1 | |
| SCHEMBL773683 | 0.73 | IDO1 (0.68) | KMT2AALDH1A1GAAHPGDLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0330504-B1 | Photosensitive material and image forming method | CANON KK (JP) | 1996-05-22 | — | — | EP | claimed |
| EP-0653680-A2 | Photosensitive composition, photosensitive material and image forming method | CANON KABUSHIKI KAISHA (JP) | 1995-05-17 | — | — | EP | claimed |
| CN-109960111-B | Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and method for forming pattern | 信越化学工业株式会社 | 2022-07-12 | — | — | CN | disclosed |
| US-11018015-B2 | Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-05-25 | — | — | US | disclosed |
| EP-3508918-B1 | COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2020-07-15 | — | — | EP | disclosed |
| EP-3508918-A1 | COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2019-07-10 | — | — | EP | disclosed |
| CN-109960111-A | Organic film forms the forming method and pattern forming method with composition, semiconductor device producing substrate, organic film | 信越化学工业株式会社 | 2019-07-02 | — | — | CN | disclosed |
| US-20190198341-A1 | COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-06-27 | — | — | US | disclosed |
| US-5663032-A | NAPHTHOL DERIVATIVE REDUCING AGENT | CANON KABUSHIKI KAISHA (JP) | 1997-09-02 | — | — | US | disclosed |
| EP-0332455-B1 | Photosensitive material and image forming method | CANON KK (JP) | 1996-06-05 | — | — | EP | disclosed |
| EP-0330504-B1 | Photosensitive material and image forming method | CANON KK (JP) | 1996-05-22 | — | — | EP | disclosed |
| EP-0653680-A2 | Photosensitive composition, photosensitive material and image forming method | CANON KABUSHIKI KAISHA (JP) | 1995-05-17 | — | — | EP | disclosed |
| US-5415974-A | Silver halide, organic silver salt, polymerizable compound, heat-diffusing dye | CANON KABUSHIKI KAISHA (JP) | 1995-05-16 | — | — | US | disclosed |
| US-5260164-A | Silver halide, organic silver salt, cyclic reducing agent, the above compounds adapted to provide imagewise oxidized product of reducing agent upon imagewise exposure and heat development, polymer precursor, photopolymerization initiator | CANON KABUSHIKI KAISHA (JP) | 1993-11-09 | — | — | US | disclosed |
| US-5064744-A | Heat, photopolymerization, silver halide contrast | CANON KABUSHIKI KAISHA (JP) | 1991-11-12 | — | — | US | disclosed |
| US-5041369-A | Silver Halide, Silver Salt, Reducing Agent, Metal or Organic Dye | CANON KABUSHIKI KAISHA (JP) | 1991-08-20 | — | — | US | disclosed |
| EP-0360014-A1 | Photosensitive material and image forming method using same | CANON KABUSHIKI KAISHA (JP) | 1990-03-28 | — | — | EP | disclosed |
| EP-0332455-A2 | Photosensitive material and image forming method | CANON KABUSHIKI KAISHA (JP) | 1989-09-13 | — | — | EP | disclosed |
| EP-0330504-A2 | Photosensitive material and image forming method | CANON KABUSHIKI KAISHA (JP) | 1989-08-30 | — | — | EP | disclosed |
| EP-0326424-A2 | Photosensitive composition, photosensitive material, and image forming method | CANON KABUSHIKI KAISHA (JP) | 1989-08-02 | — | — | EP | disclosed |