SCHEMBL893299

SCHEMBL893299

OCC1CC2CC(CO)C1C2

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
SI P14410 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1461057 1.00 SI (0.33) SICYP2C9CYP2C19
SCHEMBL10733962 0.87 CYP2C9 (0.48) CYP2C9CYP2C19
SCHEMBL14534987 0.87 GABRR1 (0.33) SI
SCHEMBL9650398 0.84 GBA1 (0.33) SI
SCHEMBL9650404 0.84 GBA1 (0.33) SI
SCHEMBL1462214 0.83
SCHEMBL19604530 0.82 CYP2C9 (0.32) CYP2C9CYP2C19
SCHEMBL17723432 0.82 SI (0.41) SI
SCHEMBL19604578 0.82 CYP2C9 (0.32) CYP2C9CYP2C19
SCHEMBL17723321 0.82 CYP2C9 (0.32) CYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4086210-A Radiation sensitive polymeric o-nitrophenyl acetals EASTMAN KODAK COMPANY (US) 1978-04-25 US claimed
EP-4617315-A1 THERMOPLASTIC POLYMER COMPOSITIONS Kraton Polymers Nederland B.V. (NL) 2025-09-17 EP disclosed
US-20250206947-A1 THERMOPLASTIC POLYMER COMPOSITIONS Kraton Corporation (US) 2025-06-26 US disclosed
WO-2020058460-A1 HIGH-TEMPERATURE-UP-RESINS (HT-UP RESIN) BASED ON CYCLIC AND NON-CYCLIC RAW MATERIALS (HT-UP) ERFINDERGEMEINSCHAFT LORENZ + GRAHNEIS GBR (DE) 2020-03-26 WO disclosed
EP-3626759-A1 HIGH-TEMPERATURE-UP-RESINS (HT-UP RESIN) BASED ON CYCLIC AND NON-CYCLIC RAW MATERIALS (HT-UP) Erfindergemeinschaft Lorenz + Grahneis GbR (DE) 2020-03-25 EP disclosed
EP-2958682-B1 PRINTABLE RADIATION CURABLE BARRIER COATINGS SUN CHEMICAL CORP (US) 2018-04-25 EP disclosed
US-9701860-B2 Printable radiation curable barrier coatings SUN CHEMICAL CORPORATION (US) 2017-07-11 US disclosed
US-20160009939-A1 PRINTABLE RADIATION CURABLE BARRIER COATINGS SUN CHEMICAL CORPORATION (US) 2016-01-14 US disclosed
EP-2958682-A1 PRINTABLE RADIATION CURABLE BARRIER COATINGS Sun Chemical Corporation (US) 2015-12-30 EP disclosed
US-9079828-B2 Polymerizable compounds comprising a polyalicylic structure element VOCO GMBH (DE) 2015-07-14 US disclosed
US-6344534-B2 HEAT RESISTANCE; WATERPROOFING DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2002-02-05 US disclosed
EP-1167416-A1 URETHANE RESIN COMPOSITION FOR SEALING OPTOELECTRIC CONVERSION DEVICES Mitsui Chemicals, Inc. (JP) 2002-01-02 EP disclosed
US-20010021766-A1 Functional polyester polymer and production process thereof DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2001-09-13 US disclosed
JP-2001064374-A NOVEL POLYESTER POLYMER AND ITS PRODUCTION DAICEL CHEM IND LTD 2001-03-13 JP disclosed
JP-2001064372-A FUNCTIONAL POLYESTER POLYMER AND ITS PRODUCTION DAICEL CHEM IND LTD 2001-03-13 JP disclosed
EP-1069145-A1 Process for producing polyester using a distannoxane catalyst DAICEL CHEMICAL INDUSTRIES, Ltd. (JP) 2001-01-17 EP disclosed
US-6057418-A Water-dilutable polyester BASF COATINGS AG (DE) 2000-05-02 US disclosed
US-5621019-A PHOTORESIST CONTAINING PHOTO ACID GENERATOR AND ULTRAVIOLET RADIATION TRANSPARENT ACRYLIC POLYMER HAVING BRIDGED CYCLOHYDROCARBON GROUP RESIDUE; RESOLUTION, DRY ETCH RESISTANCE NEC CORPORATION (JP) 1997-04-15 US disclosed
US-4131465-A Radiation sensitive polymeric o-nitrophenyl acetals and element EASTMAN KODAK COMPANY (US) 1978-12-26 US disclosed
US-4086210-A Radiation sensitive polymeric o-nitrophenyl acetals EASTMAN KODAK COMPANY (US) 1978-04-25 US disclosed