SCHEMBL8945914

SCHEMBL8945914

O=C(O)c1ccccc1C(c1ccccc1)c1ccccc1

nearest known ligand 0.79

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.79
GAA P10253 1/20 0.79
KMT2A Q03164 1/20 0.79
TDP1 Q9NUW8 1/20 0.79
ALOX15 P16050 1/20 0.54
MAPT P10636 2/20 0.50
HDAC8 Q9BY41 1/20 0.50
SRC P12931 1/20 0.48
KDM4E B2RXH2 2/20 0.46
CA12 O43570 1/20 0.46
CA1 P00915 1/20 0.46
CA2 P00918 1/20 0.46
HMGB1 P09429 1/20 0.46
HPGD P15428 1/20 0.46
CA4 P22748 1/20 0.46
CA6 P23280 1/20 0.46
CA7 P43166 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
CA9 Q16790 1/20 0.46
NAPRT Q6XQN6 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL900830 0.89 ALDH1A1 (0.68) ALDH1A1GAAKMT2ATDP1ALOX15
SCHEMBL29636490 0.88 ALDH1A1 (1.00) ALDH1A1GAAKMT2ATDP1ALOX15
SCHEMBL438546 0.88 ALDH1A1 (1.00) ALDH1A1GAAKMT2ATDP1ALOX15
SCHEMBL1507640 0.87 ALDH1A1 (0.96) ALDH1A1GAAKMT2ATDP1ALOX15
SCHEMBL18568766 0.87 ALDH1A1 (0.72) ALDH1A1GAAKMT2ATDP1ALOX15
Phenol SCHEMBL1068767 0.87 ALDH1A1 (0.96) ALDH1A1GAAKMT2ATDP1ALOX15
SCHEMBL1129359 0.84 ALDH1A1 (0.64) ALDH1A1GAAKMT2ATDP1ALOX15
Phthalic Acid SCHEMBL30249230 0.84 ALDH1A1 (0.70) ALDH1A1GAAKMT2ATDP1ALOX15
SCHEMBL4458402 0.83 ALDH1A1 (0.58) ALDH1A1GAAKMT2ATDP1MAPT
SCHEMBL11474084 0.83 ALDH1A1 (0.62) ALDH1A1GAAKMT2ATDP1ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109715771-A Spice composition 三菱瓦斯化学株式会社 2019-05-03 CN disclosed
US-5580702-A COMPRISING A PHOTOSENSITIVE ACID-GENERATING COMPOUND AND A COPOLYMER OF P-HYDROXYSTYRENE AND AN ESTER OF P-CARBOXYMETHOXYSTYRENE; NONTOXIC; STEEP WALLS; HIGH SPEED; SEMICONDUCTORS KABUSHIKI KAISHA TOSHIBA (JP) 1996-12-03 US disclosed
US-5403695-A Photolithography; high resolution; semiconductors KABUSHIKI KAISHA TOSHIBA (JP) 1995-04-04 US disclosed
US-4528136-A Process for preparing 2-[bis(aryl)methyl]benzoic acids THE HILTON-DAVIS CHEMICAL CO. (US) 1985-07-09 US disclosed
US-4399291-A CONDENSATION OF A BENZALDEHYDE, AN ANILINE, AN AMINOBENZOIC ACID; OXIDATION STERLING DRUG INC. (US) 1983-08-16 US disclosed
EP-0082394-A2 A process for the production of aminophthalides and amino benzoic acids STERLING DRUG INC. (US) 1983-06-29 EP disclosed
US-4303548-A Process for coating dispersed minute droplets with membrane MITSUBISHI PAPER MILLS, LTD. (JP) 1981-12-01 US disclosed