⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL896077 | 0.79 | — | — | |
| SCHEMBL2291844 | 0.71 | — | — | |
| SCHEMBL896072 | 0.70 | — | — | |
| SCHEMBL896107 | 0.69 | — | — | |
| SCHEMBL29632713 | 0.67 | TET2 (0.31) | — | |
| SCHEMBL65357 | 0.62 | — | — | |
| SCHEMBL271099 | 0.62 | — | — | |
| SCHEMBL274229 | 0.62 | — | — | |
| Ethylene Glycol SCHEMBL1303233 | 0.62 | — | — | |
| SCHEMBL825416 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 233 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170002221-A1 | UV CURABLE INK JET RECORDING INK COMPOSITION, INK CONTAINER AND INK JET RECORDING APPARATUS | SEIKO EPSON CORPORATION (JP) | 2017-01-05 | — | — | US | claimed |
| US-12036806-B2 | Ink jet recording method and ink jet recording apparatus | SEIKO EPSON CORPORATION (JP) | 2024-07-16 | — | — | US | disclosed |
| WO-2024135086-A1 | PHOTOCURABLE COMPOSITION, UNDERCOAT LAYER, LAMINATE AND DISPLAY DEVICE | 株式会社ダイセル | 2024-06-27 | — | — | WO | disclosed |
| US-12006440-B2 | Radiation curable inkjet inks for interior decoration | AGFA NV (BE) | 2024-06-11 | — | — | US | disclosed |
| US-20240181794-A1 | Ink Jet Method And Ink Jet Apparatus | SEIKO EPSON CORP (JP) | 2024-06-06 | — | — | US | disclosed |
| US-11981823-B2 | Radiation-curable ink jet composition and ink jet method | SEIKO EPSON CORPORATION (JP) | 2024-05-14 | — | — | US | disclosed |
| EP-4364950-A1 | ACTINIC RAY-CURABLE INKJET INK COMPOSITION | Sakata INX Corporation (JP) | 2024-05-08 | — | — | EP | disclosed |
| US-11952501-B2 | Ink set and ink jet recording method | SEIKO EPSON CORPORATION (JP) | 2024-04-09 | — | — | US | disclosed |
| WO-2024047976-A1 | PHOTOCURABLE INK-JET INK COMPOSITION | サカタインクス株式会社 | 2024-03-07 | — | — | WO | disclosed |
| US-11912051-B2 | Ink jet method and ink jet apparatus | SEIKO EPSON CORPORATION (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20120274717-A1 | PHOTOCURABLE INK COMPOSITION, RECORDING METHOD, RECORDING APPARATUS, PHOTOCURABLE INK JET RECORDING INK COMPOSITION, AND INK JET RECORDING METHOD | SEIKO EPSON CORPORATION (JP) | 2012-11-01 | — | — | US | disclosed |
| US-20120189822-A1 | RADIATION-CURABLE INK FOR INK JET RECORDING, RECORD MADE USING THE SAME, AND INK JET RECORDING METHOD USING THE SAME | SEIKO EPSON CORPORATION (JP) | 2012-07-26 | — | — | US | disclosed |
| US-20120133060-A1 | RADIATION-CURABLE INK JET COMPOSITION, RECORDING MATTER, AND INK JET RECORDING METHOD | SEIKO EPSON CORPORATION (JP) | 2012-05-31 | — | — | US | disclosed |
| US-20120083545-A1 | ULTRAVIOLET-CURABLE INK JET INK COMPOSITION | SEIKO EPSON CORPORATION | 2012-04-05 | — | — | US | disclosed |
| EP-2348081-A1 | ADHESIVE COMPOSITION AND OPTICAL MEMBER | Cheil Industries Inc. (KR) | 2011-07-27 | — | — | EP | disclosed |
| US-20080166495-A1 | IMAGE FORMING METHOD AND APPARATUS | FUJIFILM CORPORATION (JP) | 2008-07-10 | — | — | US | disclosed |
| EP-1308434-B1 | (Meth)acryloyl group-containing compound and method for producing the same | NIPPON CATALYTIC CHEM IND (JP) | 2006-03-15 | — | — | EP | disclosed |
| US-6887946-B2 | (Meth) acryloyl group-containing compound and method for producing the same | NIPPON SHOKUBAI CO., LTD. (JP) | 2005-05-03 | — | — | US | disclosed |
| US-20030134926-A1 | (Meth) acryloyl group-containing compound and method for producing the same | NIPPON SHOKUBAI CO., LTD. | 2003-07-17 | — | — | US | disclosed |
| EP-1308434-A1 | (Meth)acryloyl group-containing compound and method for producing the same | Nippon Shokubai Co., Ltd. (JP) | 2003-05-07 | — | — | EP | disclosed |