SCHEMBL8964945

SCHEMBL8964945

COc1cc(C(=O)C(C#N)=Cc2ccc(N)cc2)ccc1O

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 5/20 0.59
KMT2A Q03164 5/20 0.59
ALDH1A1 P00352 3/20 0.59
MAPT P10636 3/20 0.59
CYP1A2 P05177 3/20 0.59
KDM4E B2RXH2 2/20 0.59
RGS12 O14924 2/20 0.59
USP2 O75604 2/20 0.59
ALPL P05186 2/20 0.59
POLB P06746 2/20 0.59
CYP3A4 P08684 2/20 0.59
ALPI P09923 2/20 0.59
ALPG P10696 2/20 0.59
HPGD P15428 2/20 0.59
ALOX15 P16050 2/20 0.59
ALOX12 P18054 2/20 0.59
APEX1 P27695 2/20 0.59
MAPK1 P28482 2/20 0.59
RECQL P46063 2/20 0.59
BLM P54132 2/20 0.59

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9644186 0.93 MEN1 (0.62) MEN1KMT2AALDH1A1MAPTCYP1A2
SCHEMBL9644187 0.93 MEN1 (0.62) MEN1KMT2AALDH1A1MAPTCYP1A2
SCHEMBL8965052 0.86 ALDH1A1 (0.47) MEN1KMT2AALDH1A1MAPTCYP1A2
SCHEMBL9642823 0.79 ALDH1A1 (0.59) MEN1KMT2AALDH1A1MAPTCYP1A2
SCHEMBL9642832 0.79 ALDH1A1 (0.59) MEN1KMT2AALDH1A1MAPTCYP1A2
SCHEMBL8965231 0.79 ALDH1A1 (0.59) MEN1KMT2AALDH1A1MAPTCYP1A2
SCHEMBL8608702 0.78 CYP1A2 (0.82) MEN1KMT2AALDH1A1MAPTCYP1A2
SCHEMBL8608700 0.78 CYP1A2 (0.82) MEN1KMT2AALDH1A1MAPTCYP1A2
SCHEMBL8976999 0.78 ALDH1A1 (0.56) MEN1KMT2AALDH1A1MAPTCYP1A2
SCHEMBL8976990 0.78 ALDH1A1 (0.56) MEN1KMT2AALDH1A1MAPTCYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed