SCHEMBL8965052

SCHEMBL8965052

C=Cc1ccc(C(=O)C(C#N)=Cc2ccc(N)cc2)cc1OC

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.47
KMT2A Q03164 5/20 0.47
MAPT P10636 5/20 0.47
CYP1A2 P05177 4/20 0.47
CYP3A4 P08684 4/20 0.47
MEN1 O00255 4/20 0.47
KDM4E B2RXH2 3/20 0.47
HPGD P15428 3/20 0.47
RGS12 O14924 2/20 0.47
USP2 O75604 2/20 0.47
ALPL P05186 2/20 0.47
POLB P06746 2/20 0.47
ALPI P09923 2/20 0.47
ALPG P10696 2/20 0.47
ALOX15 P16050 2/20 0.47
ALOX12 P18054 2/20 0.47
APEX1 P27695 2/20 0.47
MAPK1 P28482 2/20 0.47
RECQL P46063 2/20 0.47
BLM P54132 2/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8964945 0.86 MEN1 (0.59) ALDH1A1KMT2AMAPTCYP1A2CYP3A4
SCHEMBL8965772 0.79 ALDH1A1 (0.54) ALDH1A1KMT2AMAPTCYP1A2CYP3A4
SCHEMBL9644187 0.79 MEN1 (0.62) ALDH1A1KMT2AMAPTCYP1A2CYP3A4
SCHEMBL9644186 0.79 MEN1 (0.62) ALDH1A1KMT2AMAPTCYP1A2CYP3A4
SCHEMBL8965373 0.74 CYP1A2 (0.53) ALDH1A1KMT2AMAPTCYP1A2CYP3A4
SCHEMBL8965231 0.73 ALDH1A1 (0.59) ALDH1A1KMT2AMAPTCYP1A2CYP3A4
SCHEMBL9642832 0.73 ALDH1A1 (0.59) ALDH1A1KMT2AMAPTCYP1A2CYP3A4
SCHEMBL9642823 0.73 ALDH1A1 (0.59) ALDH1A1KMT2AMAPTCYP1A2CYP3A4
SCHEMBL8976990 0.72 ALDH1A1 (0.56) ALDH1A1KMT2AMAPTCYP1A2CYP3A4
SCHEMBL8976999 0.72 ALDH1A1 (0.56) ALDH1A1KMT2AMAPTCYP1A2CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed