SCHEMBL8965404

SCHEMBL8965404

C=Cc1ccc(C(=O)C=Cc2ccc(OC)c(OC)c2)cc1[N+](=O)[O-]

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ABCG2 Q9UNQ0 5/20 0.64
LMNA P02545 4/20 0.62
ALDH1A1 P00352 2/20 0.62
HPGD P15428 1/20 0.62
MEN1 O00255 2/20 0.62
KMT2A Q03164 2/20 0.62
MAPT P10636 3/20 0.59
GAA P10253 1/20 0.59
HTT P42858 1/20 0.59
PDE4A P27815 1/20 0.58
PDE4B Q07343 1/20 0.58
PDE4C Q08493 1/20 0.58
PDE4D Q08499 1/20 0.58
TNFRSF1A P19438 2/20 0.57
NPSR1 Q6W5P4 2/20 0.57
CA1 P00915 1/20 0.56
CA2 P00918 1/20 0.56
ABCB1 P08183 1/20 0.55
ATM Q13315 2/20 0.54
NPC1 O15118 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965003 0.85 LMNA (0.72) ABCG2LMNAALDH1A1HPGDMEN1
SCHEMBL8965000 0.85 LMNA (0.72) ABCG2LMNAALDH1A1HPGDMEN1
SCHEMBL8977023 0.81 LMNA (0.69) ABCG2LMNAALDH1A1HPGDMEN1
SCHEMBL8977014 0.81 LMNA (0.69) ABCG2LMNAALDH1A1HPGDMEN1
SCHEMBL2458577 0.79 ABCG2 (1.00) ABCG2LMNAMEN1KMT2AMAPT
SCHEMBL2458579 0.79 ABCG2 (1.00) ABCG2LMNAMEN1KMT2AMAPT
SCHEMBL15795448 0.79 ALDH1A1 (0.59) ABCG2LMNAALDH1A1HPGDMEN1
SCHEMBL15795447 0.79 ALDH1A1 (0.59) ABCG2LMNAALDH1A1HPGDMEN1
SCHEMBL6349917 0.78 KRAS (0.74) ABCG2LMNAALDH1A1HPGDMEN1
SCHEMBL15807747 0.78 KRAS (0.77) ABCG2LMNAALDH1A1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed