SCHEMBL8965213

SCHEMBL8965213

COc1ccc(C=C(C#N)C(=O)c2ccc(O)cc2)cc1C

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EGFR P00533 6/20 0.57
ERBB2 P04626 6/20 0.57
CYP1A2 P05177 3/20 0.54
KLK7 P49862 1/20 0.53
MAPT P10636 6/20 0.53
KMT2A Q03164 5/20 0.53
ALDH1A1 P00352 5/20 0.52
MEN1 O00255 3/20 0.52
POLB P06746 3/20 0.52
KDM4E B2RXH2 3/20 0.52
L3MBTL1 Q9Y468 3/20 0.52
RGS12 O14924 2/20 0.52
USP2 O75604 2/20 0.52
ALPL P05186 2/20 0.52
CYP3A4 P08684 2/20 0.52
ALPI P09923 2/20 0.52
ALPG P10696 2/20 0.52
HPGD P15428 2/20 0.52
ALOX15 P16050 2/20 0.52
ALOX12 P18054 2/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8976999 0.93 ALDH1A1 (0.56) EGFRERBB2CYP1A2KLK7MAPT
SCHEMBL8976990 0.93 ALDH1A1 (0.56) EGFRERBB2CYP1A2KLK7MAPT
SCHEMBL8965373 0.89 CYP1A2 (0.53) EGFRERBB2CYP1A2MAPTKMT2A
SCHEMBL8965376 0.81 ALDH1A1 (0.55) EGFRERBB2CYP1A2MAPTKMT2A
SCHEMBL3428284 0.81 ALDH1A1 (0.64) CYP1A2KLK7MAPTKMT2AALDH1A1
SCHEMBL8976994 0.81 ALDH1A1 (0.55) EGFRERBB2CYP1A2MAPTKMT2A
SCHEMBL3428282 0.81 ALDH1A1 (0.64) CYP1A2KLK7MAPTKMT2AALDH1A1
SCHEMBL8976998 0.81 ALDH1A1 (0.55) EGFRERBB2CYP1A2MAPTKMT2A
SCHEMBL13936216 0.79 CYP1A2 (0.69) EGFRERBB2CYP1A2MAPTKMT2A
SCHEMBL9644186 0.78 MEN1 (0.62) EGFRERBB2CYP1A2KLK7MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed