SCHEMBL8965373

SCHEMBL8965373

C=Cc1ccc(C(=O)C(C#N)=Cc2ccc(OC)c(C)c2)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 3/20 0.53
EGFR P00533 6/20 0.53
ERBB2 P04626 6/20 0.53
ALDH1A1 P00352 7/20 0.51
PKM P14618 2/20 0.51
HTT P42858 1/20 0.51
MAPT P10636 7/20 0.48
KMT2A Q03164 4/20 0.48
HPGD P15428 4/20 0.48
POLB P06746 3/20 0.48
MEN1 O00255 3/20 0.48
KDM4E B2RXH2 3/20 0.48
L3MBTL1 Q9Y468 3/20 0.48
CYP3A4 P08684 3/20 0.48
SMN1; SMN2 Q16637 3/20 0.48
RGS12 O14924 2/20 0.48
USP2 O75604 2/20 0.48
ALPL P05186 2/20 0.48
ALPI P09923 2/20 0.48
ALPG P10696 2/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965213 0.89 EGFR (0.57) CYP1A2EGFRERBB2ALDH1A1PKM
SCHEMBL8976999 0.82 ALDH1A1 (0.56) CYP1A2EGFRERBB2ALDH1A1PKM
SCHEMBL8976990 0.82 ALDH1A1 (0.56) CYP1A2EGFRERBB2ALDH1A1PKM
SCHEMBL3428282 0.80 ALDH1A1 (0.64) CYP1A2ALDH1A1PKMHTTMAPT
SCHEMBL3428284 0.80 ALDH1A1 (0.64) CYP1A2ALDH1A1PKMHTTMAPT
SCHEMBL13936216 0.78 CYP1A2 (0.69) CYP1A2EGFRERBB2ALDH1A1PKM
SCHEMBL9644186 0.75 MEN1 (0.62) CYP1A2EGFRERBB2ALDH1A1MAPT
SCHEMBL9644187 0.75 MEN1 (0.62) CYP1A2EGFRERBB2ALDH1A1MAPT
SCHEMBL8965772 0.74 ALDH1A1 (0.54) CYP1A2EGFRERBB2ALDH1A1PKM
SCHEMBL8965052 0.74 ALDH1A1 (0.47) CYP1A2EGFRERBB2ALDH1A1PKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed