SCHEMBL8965216

SCHEMBL8965216

Nc1ccc(C=C(Cl)C(=O)c2ccc(O)cc2)cc1

nearest known ligand 0.54

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
APP P05067 1/20 0.50
ESR1 P03372 5/20 0.46
ESR2 Q92731 5/20 0.46
ALDH1A1 P00352 2/20 0.45
CA3 P07451 1/20 0.45
CYP3A4 P08684 1/20 0.45
THRB P10828 1/20 0.45
ALOX15 P16050 1/20 0.45
CA6 P23280 1/20 0.45
CASP1 P29466 1/20 0.45
HIF1A Q16665 1/20 0.45
HSD17B10 Q99714 1/20 0.45
CA14 Q9ULX7 1/20 0.45
CPT1B Q92523 1/20 0.42
KDM4E B2RXH2 1/20 0.42
CES2 O00748 1/20 0.41
CYP19A1 P11511 1/20 0.41
F3 P13726 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9644199 1.00 APP (0.50) APPESR1ESR2ALDH1A1CA3
SCHEMBL9644197 1.00 APP (0.50) APPESR1ESR2ALDH1A1CA3
SCHEMBL8965259 0.87 ALDH1A1 (0.35) APPESR1ESR2ALDH1A1CYP3A4
SCHEMBL17103104 0.82 CES2 (0.59) ESR1ESR2ALDH1A1CYP3A4CPT1B
SCHEMBL27497257 0.82 CES2 (0.59) ESR1ESR2ALDH1A1CA3CYP3A4
SCHEMBL15752516 0.82 CES2 (0.59) ESR1ESR2ALDH1A1CYP3A4CPT1B
SCHEMBL17103107 0.82 CES2 (0.59) ESR1ESR2ALDH1A1CYP3A4CPT1B
SCHEMBL9642823 0.78 ALDH1A1 (0.59) ESR1ESR2ALDH1A1CYP3A4ALOX15
SCHEMBL11687191 0.78 CES2 (0.53) APPESR1CYP3A4CES2
SCHEMBL11687187 0.78 CES2 (0.53) APPESR1CYP3A4CES2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed