SCHEMBL8965259

SCHEMBL8965259

C=Cc1ccc(C(=O)C(Cl)=Cc2ccc(N)cc2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.35
APP P05067 1/20 0.35
CYP1B1 Q16678 1/20 0.35
KMT2A Q03164 3/20 0.34
NPC1 O15118 3/20 0.34
RAB9A P51151 3/20 0.34
SMN1; SMN2 Q16637 3/20 0.34
NFKB1 P19838 2/20 0.34
NFKB2 Q00653 2/20 0.34
RELA Q04206 2/20 0.34
MEN1 O00255 2/20 0.34
LMNA P02545 2/20 0.34
TAS1R3 Q7RTX0 1/20 0.34
TAS1R1 Q7RTX1 1/20 0.34
MAPT P10636 1/20 0.34
HTT P42858 1/20 0.34
CYP3A4 P08684 3/20 0.33
TDP1 Q9NUW8 3/20 0.33
L3MBTL1 Q9Y468 2/20 0.33
HDAC2 Q92769 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9644199 0.87 APP (0.50) ALDH1A1APPCYP3A4ESR1ESR2
SCHEMBL9644197 0.87 APP (0.50) ALDH1A1APPCYP3A4ESR1ESR2
SCHEMBL8965216 0.87 APP (0.50) ALDH1A1APPCYP3A4ESR1ESR2
SCHEMBL8965772 0.77 ALDH1A1 (0.54) ALDH1A1KMT2ASMN1; SMN2MEN1LMNA
SCHEMBL28958521 0.75 ALDH1A1 (0.52) ALDH1A1CYP1B1KMT2ANPC1RAB9A
SCHEMBL3753579 0.74 ALDH1A1 (0.58) ALDH1A1TAS1R3TAS1R1TDP1
SCHEMBL87361 0.72
SCHEMBL362842 0.70 ALDH1A1 (0.52) ALDH1A1KMT2ALMNATAS1R3TAS1R1
Formic Acid SCHEMBL20943275 0.70 ALDH1A1 (0.52) ALDH1A1APPKMT2ARAB9AMEN1
Hydrochloric Acid SCHEMBL761106 0.70 ALDH1A1 (0.65) ALDH1A1APPKMT2AMEN1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed