SCHEMBL8965252

SCHEMBL8965252

O=C(/C=C/c1ccc([N+](=O)[O-])c(Cl)c1)c1ccc(O)cc1

nearest known ligand 0.81

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 8/20 0.81
NPSR1 Q6W5P4 3/20 0.81
RAB9A P51151 3/20 0.81
RECQL P46063 3/20 0.81
MITF O75030 1/20 0.81
ALDH1A1 P00352 4/20 0.65
TDP1 Q9NUW8 3/20 0.65
MEN1 O00255 5/20 0.60
KMT2A Q03164 5/20 0.60
MAPK1 P28482 3/20 0.60
HTT P42858 3/20 0.60
LMNA P02545 3/20 0.60
NPC1 O15118 1/20 0.60
SMN1; SMN2 Q16637 2/20 0.57
MAOB P27338 3/20 0.57
CXCL12 P48061 1/20 0.57
F3 P13726 1/20 0.56
MAOA P21397 1/20 0.54
BACE1 P56817 2/20 0.53
HSP90AA1 P07900 2/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965249 1.00 MAPT (0.81) MAPTNPSR1RAB9ARECQLMITF
SCHEMBL8977183 0.92 MAPT (0.73) MAPTNPSR1RAB9ARECQLMITF
SCHEMBL8977182 0.92 MAPT (0.73) MAPTNPSR1RAB9ARECQLMITF
SCHEMBL25201160 0.90 MAPT (1.00) MAPTNPSR1RAB9ARECQLMITF
SCHEMBL25217899 0.90 MAPT (1.00) MAPTNPSR1RAB9ARECQLMITF
SCHEMBL8965115 0.88 MAPT (0.64) MAPTNPSR1RAB9ARECQLMITF
SCHEMBL8965713 0.84 MAPT (0.69) MAPTNPSR1RAB9ARECQLMITF
SCHEMBL30383025 0.84 MAPT (0.69) MAPTNPSR1RAB9ARECQLMITF
SCHEMBL8965711 0.84 MAPT (0.69) MAPTNPSR1RAB9ARECQLMITF
SCHEMBL25189361 0.84 MAPT (0.76) MAPTNPSR1RAB9ARECQLMITF

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed