SCHEMBL8965115

SCHEMBL8965115

C=Cc1ccc(C(=O)C=Cc2ccc([N+](=O)[O-])c(Cl)c2)cc1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 8/20 0.64
RAB9A P51151 3/20 0.64
RECQL P46063 2/20 0.64
NPSR1 Q6W5P4 2/20 0.64
MITF O75030 1/20 0.64
MAOB P27338 6/20 0.53
MAOA P21397 4/20 0.53
LMNA P02545 4/20 0.52
HSP90AA1 P07900 1/20 0.52
PTGS2 P35354 1/20 0.51
ALDH1A1 P00352 5/20 0.51
MAPK1 P28482 4/20 0.51
TDP1 Q9NUW8 3/20 0.51
SMN1; SMN2 Q16637 3/20 0.49
HPGD P15428 2/20 0.49
L3MBTL1 Q9Y468 2/20 0.49
NPC1 O15118 2/20 0.49
MEN1 O00255 2/20 0.48
KMT2A Q03164 2/20 0.48
POLB P06746 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965252 0.88 MAPT (0.81) MAPTRAB9ARECQLNPSR1MITF
SCHEMBL8965249 0.88 MAPT (0.81) MAPTRAB9ARECQLNPSR1MITF
SCHEMBL8965178 0.85 ALDH1A1 (0.57) MAPTRAB9ARECQLNPSR1MITF
SCHEMBL8977183 0.81 MAPT (0.73) MAPTRAB9ARECQLNPSR1MITF
SCHEMBL8977182 0.81 MAPT (0.73) MAPTRAB9ARECQLNPSR1MITF
SCHEMBL16954832 0.80 MAPK1 (0.58) MAPTRAB9ARECQLNPSR1MITF
SCHEMBL5707129 0.79 PLA2G4A (0.59) MAPTRAB9ARECQLNPSR1MITF
SCHEMBL5707133 0.79 PLA2G4A (0.59) MAPTRAB9ARECQLNPSR1MITF
SCHEMBL30641924 0.79 PLA2G4A (0.59) MAPTRAB9ARECQLNPSR1MITF
SCHEMBL8965203 0.78 MAOB (0.74) MAPTMAOBMAOALMNAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed