SCHEMBL8965713

SCHEMBL8965713

Cc1cc(/C=C/C(=O)c2ccc(O)cc2)ccc1[N+](=O)[O-]

nearest known ligand 0.69

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 10/20 0.69
RAB9A P51151 6/20 0.69
NPSR1 Q6W5P4 4/20 0.69
RECQL P46063 3/20 0.69
MITF O75030 1/20 0.69
ALDH1A1 P00352 7/20 0.68
TDP1 Q9NUW8 3/20 0.68
MAPK1 P28482 4/20 0.60
HTT P42858 4/20 0.60
MEN1 O00255 4/20 0.60
KMT2A Q03164 4/20 0.60
SMN1; SMN2 Q16637 4/20 0.60
LMNA P02545 6/20 0.60
NPC1 O15118 3/20 0.60
MAOA P21397 2/20 0.57
MAOB P27338 2/20 0.57
POLB P06746 2/20 0.57
HPGD P15428 3/20 0.57
F3 P13726 1/20 0.56
P4HB P07237 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30383025 1.00 MAPT (0.69) MAPTRAB9ANPSR1RECQLMITF
SCHEMBL8965711 1.00 MAPT (0.69) MAPTRAB9ANPSR1RECQLMITF
SCHEMBL25196726 0.90 MAPT (0.73) MAPTRAB9ANPSR1RECQLMITF
SCHEMBL8965178 0.88 ALDH1A1 (0.57) MAPTRAB9ANPSR1RECQLMITF
SCHEMBL8965249 0.84 MAPT (0.81) MAPTRAB9ANPSR1RECQLMITF
SCHEMBL8965252 0.84 MAPT (0.81) MAPTRAB9ANPSR1RECQLMITF
SCHEMBL25189361 0.84 MAPT (0.76) MAPTRAB9ANPSR1RECQLMITF
SCHEMBL25196827 0.82 MAPT (0.70) MAPTRAB9ANPSR1RECQLMITF
SCHEMBL25278471 0.82 MAPT (0.70) MAPTRAB9ANPSR1RECQLMITF
SCHEMBL8965212 0.82 F3 (0.69) MAPTRAB9ANPSR1ALDH1A1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed