SCHEMBL8965772

SCHEMBL8965772

C=Cc1ccc(C(=O)C(C#N)=Cc2ccc(N)cc2)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.54
KMT2A Q03164 5/20 0.54
KDM4E B2RXH2 4/20 0.54
PKM P14618 2/20 0.54
ATM Q13315 1/20 0.54
EGFR P00533 6/20 0.50
ERBB2 P04626 5/20 0.50
MEN1 O00255 3/20 0.50
MAPT P10636 3/20 0.50
POLB P06746 3/20 0.50
USP2 O75604 2/20 0.50
LMNA P02545 2/20 0.50
MAPK1 P28482 2/20 0.50
RECQL P46063 2/20 0.50
BLM P54132 2/20 0.50
L3MBTL1 Q9Y468 2/20 0.50
TDP1 Q9NUW8 2/20 0.50
CYP3A4 P08684 2/20 0.50
HPGD P15428 2/20 0.50
RGS12 O14924 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965231 0.87 ALDH1A1 (0.59) ALDH1A1KMT2AKDM4EPKMATM
SCHEMBL9642832 0.87 ALDH1A1 (0.59) ALDH1A1KMT2AKDM4EPKMATM
SCHEMBL9642823 0.87 ALDH1A1 (0.59) ALDH1A1KMT2AKDM4EPKMATM
SCHEMBL2349031 0.85 ALDH1A1 (0.73) ALDH1A1KMT2AKDM4EPKMATM
SCHEMBL2349038 0.85 ALDH1A1 (0.73) ALDH1A1KMT2AKDM4EPKMATM
SCHEMBL8965459 0.82 KMT2A (0.76) ALDH1A1KMT2AKDM4EPKMATM
SCHEMBL8965052 0.79 ALDH1A1 (0.47) ALDH1A1KMT2AKDM4EPKMATM
SCHEMBL8965259 0.77 ALDH1A1 (0.35) ALDH1A1KMT2APKMMEN1MAPT
SCHEMBL8965194 0.77 KMT2A (0.56) ALDH1A1KMT2AKDM4EPKMATM
SCHEMBL7994142 0.76 EGFR (0.76) ALDH1A1KMT2AKDM4EPKMATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed