SCHEMBL8965681

SCHEMBL8965681

C=C(C)C(=O)Oc1ccc(C(=O)C(C#N)=Cc2ccc(OC)cc2)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 11/20 0.50
MAPT P10636 6/20 0.50
KDM4E B2RXH2 6/20 0.50
SMN1; SMN2 Q16637 2/20 0.50
KMT2A Q03164 6/20 0.47
MEN1 O00255 4/20 0.47
LMNA P02545 2/20 0.47
BLM P54132 2/20 0.46
HPGD P15428 2/20 0.46
CYP1A2 P05177 1/20 0.46
CYP3A4 P08684 1/20 0.46
TSHR P16473 1/20 0.46
NFKB1 P19838 1/20 0.46
APEX1 P27695 1/20 0.46
PMP22 Q01453 1/20 0.46
NPSR1 Q6W5P4 1/20 0.46
PKM P14618 1/20 0.45
ATM Q13315 1/20 0.45
ELANE P08246 1/20 0.45
EGFR P00533 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965854 0.85 ALDH1A1 (0.50) ALDH1A1MAPTKDM4ESMN1; SMN2KMT2A
SCHEMBL14103907 0.82 EGFR (0.64) ALDH1A1MAPTKDM4ESMN1; SMN2KMT2A
SCHEMBL14378641 0.82 EGFR (0.55) ALDH1A1KDM4EHPGDCYP3A4ELANE
SCHEMBL310448 0.82 EGFR (0.55) ALDH1A1KDM4EHPGDCYP3A4ELANE
SCHEMBL8976998 0.82 ALDH1A1 (0.55) ALDH1A1MAPTKDM4ESMN1; SMN2KMT2A
SCHEMBL310447 0.82 EGFR (0.55) ALDH1A1KDM4EHPGDCYP3A4ELANE
SCHEMBL8976994 0.82 ALDH1A1 (0.55) ALDH1A1MAPTKDM4ESMN1; SMN2KMT2A
SCHEMBL8965376 0.82 ALDH1A1 (0.55) ALDH1A1MAPTKDM4ESMN1; SMN2KMT2A
SCHEMBL14104052 0.81 ALDH1A1 (0.68) ALDH1A1MAPTKDM4EKMT2AMEN1
SCHEMBL13412689 0.81 ALDH1A1 (0.68) ALDH1A1MAPTKDM4EKMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed