SCHEMBL8965854

SCHEMBL8965854

C=CC(=O)Oc1ccc(C(=O)C(C#N)=Cc2ccc(OC)cc2)cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 10/20 0.50
KDM4E B2RXH2 5/20 0.49
SMN1; SMN2 Q16637 2/20 0.49
MAPT P10636 6/20 0.48
BLM P54132 3/20 0.48
CYP1A2 P05177 2/20 0.48
CYP3A4 P08684 2/20 0.48
HPGD P15428 2/20 0.48
APEX1 P27695 2/20 0.48
PMP22 Q01453 2/20 0.48
TSHR P16473 1/20 0.48
NFKB1 P19838 1/20 0.48
NPSR1 Q6W5P4 1/20 0.48
KMT2A Q03164 7/20 0.47
MEN1 O00255 5/20 0.47
PKM P14618 1/20 0.47
ATM Q13315 1/20 0.47
LMNA P02545 3/20 0.47
EGFR P00533 2/20 0.46
ERBB2 P04626 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965681 0.85 ALDH1A1 (0.50) ALDH1A1KDM4ESMN1; SMN2MAPTBLM
SCHEMBL8976994 0.84 ALDH1A1 (0.55) ALDH1A1KDM4ESMN1; SMN2MAPTBLM
SCHEMBL14103907 0.84 EGFR (0.64) ALDH1A1KDM4ESMN1; SMN2MAPTBLM
SCHEMBL8965376 0.84 ALDH1A1 (0.55) ALDH1A1KDM4ESMN1; SMN2MAPTBLM
SCHEMBL8976998 0.84 ALDH1A1 (0.55) ALDH1A1KDM4ESMN1; SMN2MAPTBLM
SCHEMBL13412689 0.83 ALDH1A1 (0.68) ALDH1A1KDM4EMAPTBLMCYP1A2
SCHEMBL14104052 0.83 ALDH1A1 (0.68) ALDH1A1KDM4EMAPTBLMCYP1A2
SCHEMBL13766388 0.81 ALDH1A1 (0.44) ALDH1A1KDM4EMAPTCYP3A4HPGD
Methacrylic Acid SCHEMBL8965253 0.80 ALDH1A1 (0.45) ALDH1A1KDM4ESMN1; SMN2MAPTHPGD
SCHEMBL5550763 0.80 EGFR (0.59) ALDH1A1KDM4ECYP3A4HPGDEGFR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed