SCHEMBL8965685

SCHEMBL8965685

C=Cc1ccc(C(=O)C=Cc2ccc(C)cc2)cc1

nearest known ligand 0.83

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.83
MAOB P27338 7/20 0.73
MAOA P21397 4/20 0.73
POLB P06746 1/20 0.73
RAB9A P51151 1/20 0.73
ALDH1A1 P00352 4/20 0.70
HPGD P15428 3/20 0.70
CYP1B1 Q16678 2/20 0.70
CYP3A4 P08684 1/20 0.70
CYP1A1 P04798 1/20 0.65
HTT P42858 3/20 0.60
NPSR1 Q6W5P4 3/20 0.60
PKM P14618 2/20 0.60
ATM Q13315 2/20 0.60
LMNA P02545 2/20 0.60
NLRP1 Q9C000 1/20 0.60
MEN1 O00255 1/20 0.60
NTSR1 P30989 1/20 0.60
KMT2A Q03164 1/20 0.60
SMN1; SMN2 Q16637 1/20 0.60

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7940511 0.95 MAPT (0.75) MAPTMAOBMAOAPOLBRAB9A
4,4'-Dimethylchalcone SCHEMBL979560 0.91 MAPT (1.00) MAPTMAOBMAOAPOLBRAB9A
4,4'-Dimethylchalcone SCHEMBL979559 0.91 MAPT (1.00) MAPTMAOBMAOAPOLBRAB9A
SCHEMBL22099225 0.86 MAPT (0.89) MAPTMAOBMAOAPOLBRAB9A
SCHEMBL22098902 0.86 MAPT (0.89) MAPTMAOBMAOAPOLBRAB9A
SCHEMBL25194931 0.84 MAPT (0.86) MAPTMAOBMAOAPOLBRAB9A
SCHEMBL8480925 0.84 MAPT (0.86) MAPTMAOBMAOAPOLBRAB9A
SCHEMBL8965038 0.84 F3 (0.82) MAPTMAOBMAOAPOLBRAB9A
SCHEMBL10497491 0.84 MAPT (0.86) MAPTMAOBMAOAPOLBRAB9A
SCHEMBL548040 0.84 MAPT (1.00) MAPTMAOBMAOAPOLBRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed