SCHEMBL8965178

SCHEMBL8965178

C=Cc1ccc(C(=O)C=Cc2ccc([N+](=O)[O-])c(C)c2)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 11/20 0.57
MAPT P10636 11/20 0.57
MAPK1 P28482 6/20 0.57
TDP1 Q9NUW8 5/20 0.57
RECQL P46063 2/20 0.57
NPSR1 Q6W5P4 4/20 0.54
RAB9A P51151 4/20 0.54
MITF O75030 1/20 0.54
MAOA P21397 2/20 0.53
MAOB P27338 2/20 0.53
LMNA P02545 7/20 0.53
HPGD P15428 3/20 0.53
SMN1; SMN2 Q16637 3/20 0.52
L3MBTL1 Q9Y468 3/20 0.52
NPC1 O15118 2/20 0.52
TSHR P16473 1/20 0.50
HTT P42858 3/20 0.49
GAA P10253 2/20 0.49
PTPN1 P18031 1/20 0.49
MEN1 O00255 3/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30383025 0.88 MAPT (0.69) ALDH1A1MAPTMAPK1TDP1RECQL
SCHEMBL8965713 0.88 MAPT (0.69) ALDH1A1MAPTMAPK1TDP1RECQL
SCHEMBL8965711 0.88 MAPT (0.69) ALDH1A1MAPTMAPK1TDP1RECQL
SCHEMBL8965115 0.85 MAPT (0.64) ALDH1A1MAPTMAPK1TDP1RECQL
SCHEMBL8964936 0.82 MAPT (0.56) ALDH1A1MAPTTDP1RAB9AMAOA
SCHEMBL5458282 0.80 MAPT (0.51) ALDH1A1MAPTTDP1RECQLRAB9A
SCHEMBL8965203 0.78 MAOB (0.74) ALDH1A1MAPTMAOAMAOBLMNA
SCHEMBL25196726 0.78 MAPT (0.73) ALDH1A1MAPTMAPK1TDP1RECQL
SCHEMBL9779631 0.76 MAPT (0.71) ALDH1A1MAPTMAPK1TDP1RECQL
SCHEMBL9779633 0.76 MAPT (0.71) ALDH1A1MAPTMAPK1TDP1RECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed