SCHEMBL8965782

SCHEMBL8965782

CN(C)c1ccc(C=C(C#N)C(=O)c2ccc(O)cc2)cc1

nearest known ligand 0.78

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 10/20 0.78
KMT2A Q03164 9/20 0.78
MEN1 O00255 8/20 0.78
MAPT P10636 6/20 0.78
L3MBTL1 Q9Y468 4/20 0.58
USP2 O75604 3/20 0.58
RECQL P46063 3/20 0.58
MAPK1 P28482 3/20 0.58
LMNA P02545 2/20 0.58
POLB P06746 2/20 0.58
BLM P54132 2/20 0.58
KDM4E B2RXH2 3/20 0.55
CYP3A4 P08684 2/20 0.55
HPGD P15428 2/20 0.55
CISD1 Q9NZ45 1/20 0.55
SLC16A3 O15427 1/20 0.55
SLC16A1 P53985 1/20 0.55
GPR35 Q9HC97 1/20 0.55
EGFR P00533 4/20 0.53
ERBB2 P04626 4/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9642804 1.00 ALDH1A1 (0.78) ALDH1A1KMT2AMEN1MAPTL3MBTL1
SCHEMBL9642815 1.00 ALDH1A1 (0.78) ALDH1A1KMT2AMEN1MAPTL3MBTL1
SCHEMBL8965459 0.88 KMT2A (0.76) ALDH1A1KMT2AMEN1MAPTL3MBTL1
SCHEMBL2072452 0.87 ALDH1A1 (1.00) ALDH1A1KMT2AMEN1MAPTL3MBTL1
SCHEMBL7896356 0.87 ALDH1A1 (1.00) ALDH1A1KMT2AMEN1MAPTL3MBTL1
SCHEMBL2072454 0.87 ALDH1A1 (1.00) ALDH1A1KMT2AMEN1MAPTL3MBTL1
SCHEMBL9642823 0.81 ALDH1A1 (0.59) ALDH1A1KMT2AMEN1MAPTL3MBTL1
SCHEMBL9642832 0.81 ALDH1A1 (0.59) ALDH1A1KMT2AMEN1MAPTL3MBTL1
SCHEMBL8965231 0.81 ALDH1A1 (0.59) ALDH1A1KMT2AMEN1MAPTL3MBTL1
SCHEMBL8976994 0.81 ALDH1A1 (0.55) ALDH1A1KMT2AMEN1MAPTL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed