SCHEMBL8965459

SCHEMBL8965459

C=Cc1ccc(C(=O)C(C#N)=Cc2ccc(N(C)C)cc2)cc1

nearest known ligand 0.76

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 10/20 0.76
ALDH1A1 P00352 10/20 0.76
MEN1 O00255 8/20 0.76
MAPT P10636 7/20 0.76
L3MBTL1 Q9Y468 4/20 0.57
USP2 O75604 3/20 0.57
RECQL P46063 3/20 0.57
MAPK1 P28482 3/20 0.57
POLB P06746 3/20 0.57
LMNA P02545 3/20 0.57
BLM P54132 2/20 0.57
KDM4E B2RXH2 2/20 0.50
PSMD14 O00487 1/20 0.50
PKM P14618 1/20 0.50
ATM Q13315 1/20 0.50
TDP1 Q9NUW8 2/20 0.49
EGFR P00533 3/20 0.49
ERBB2 P04626 3/20 0.49
RAB9A P51151 1/20 0.48
CA12 O43570 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9642804 0.88 ALDH1A1 (0.78) KMT2AALDH1A1MEN1MAPTL3MBTL1
SCHEMBL9642815 0.88 ALDH1A1 (0.78) KMT2AALDH1A1MEN1MAPTL3MBTL1
SCHEMBL8965782 0.88 ALDH1A1 (0.78) KMT2AALDH1A1MEN1MAPTL3MBTL1
SCHEMBL2072454 0.86 ALDH1A1 (1.00) KMT2AALDH1A1MEN1MAPTL3MBTL1
SCHEMBL2072452 0.86 ALDH1A1 (1.00) KMT2AALDH1A1MEN1MAPTL3MBTL1
SCHEMBL7896356 0.86 ALDH1A1 (1.00) KMT2AALDH1A1MEN1MAPTL3MBTL1
SCHEMBL8965772 0.82 ALDH1A1 (0.54) KMT2AALDH1A1MEN1MAPTL3MBTL1
SCHEMBL16544440 0.78 MEN1 (0.71) KMT2AALDH1A1MEN1MAPTKDM4E
SCHEMBL5950751 0.78 MEN1 (0.71) KMT2AALDH1A1MEN1MAPTKDM4E
SCHEMBL5950754 0.78 MEN1 (0.71) KMT2AALDH1A1MEN1MAPTKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed