Methacrylic Acid

Methacrylic Acid

SCHEMBL8965253

C=C(C)C(=O)O.C=C(C)C(=O)OCC1CO1.C=CC(=O)Oc1ccc(C(=O)C(C#N)=Cc2ccc(OC)cc2)cc1

nearest known ligand 0.45

Full drug profile on Sugi Atlas →

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 12/20 0.45
KDM4E B2RXH2 7/20 0.45
SMN1; SMN2 Q16637 2/20 0.45
KMT2A Q03164 3/20 0.43
MEN1 O00255 2/20 0.43
LMNA P02545 2/20 0.43
RAB9A P51151 1/20 0.41
MAPT P10636 2/20 0.39
HPGD P15428 4/20 0.38
GAA P10253 2/20 0.38
PKM P14618 1/20 0.36
ATM Q13315 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965854 0.80 ALDH1A1 (0.50) ALDH1A1KDM4ESMN1; SMN2KMT2AMEN1
SCHEMBL8965681 0.78 ALDH1A1 (0.50) ALDH1A1KDM4ESMN1; SMN2KMT2AMEN1
Methacrylic Acid SCHEMBL8965210 0.76 F3 (0.39) ALDH1A1KMT2AMEN1LMNARAB9A
Methacrylic Acid SCHEMBL8965245 0.75 TNFRSF1A (0.43) ALDH1A1KDM4EKMT2AMEN1LMNA
SCHEMBL8965374 0.75 F3 (0.44) ALDH1A1KMT2AMEN1LMNARAB9A
SCHEMBL8965834 0.72 TNFRSF1A (0.45) ALDH1A1KDM4EKMT2AMEN1LMNA
Methacrylic Acid SCHEMBL27535619 0.71 ALDH1A1 (0.68) ALDH1A1
SCHEMBL13412689 0.69 ALDH1A1 (0.68) ALDH1A1KDM4EKMT2AMEN1MAPT
SCHEMBL14104052 0.69 ALDH1A1 (0.68) ALDH1A1KDM4EKMT2AMEN1MAPT
SCHEMBL3805894 0.69 ALDH1A1 (0.71) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed