Acetic Acid Phenyl Ester

Acetic Acid Phenyl Ester

SCHEMBL896673

CC(=O)Oc1ccccc1.CC(O)COC(C)COC(C)CO.CCOCC

nearest known ligand 0.40

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Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.40
ELANE P08246 2/20 0.38
GAA P10253 2/20 0.37
MAPT P10636 2/20 0.37
ALDH1A1 P00352 1/20 0.37
HSP90AA1 P07900 1/20 0.37
TDP1 Q9NUW8 2/20 0.36
KMT2A Q03164 2/20 0.36
POLB P06746 1/20 0.36
BACE1 P56817 1/20 0.35
CYP1A2 P05177 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
ESRRB O95718 2/20 0.35
MTNR1A P48039 4/20 0.35
MTNR1B P49286 4/20 0.35
NPY5R Q15761 1/20 0.33
NPC1 O15118 1/20 0.33
RAB9A P51151 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid Phenyl Ester SCHEMBL578330 0.86 ELANE (0.47) LMNAELANEGAAMAPTALDH1A1
Methyl Benzoate SCHEMBL6248526 0.81 TSHR (0.46) LMNAMAPTALDH1A1TDP1KMT2A
Ethyl Benzoate SCHEMBL22832624 0.81 ALDH1A1 (0.44) LMNAGAAMAPTALDH1A1KMT2A
Ether SCHEMBL5072571 0.80 TDP1 (0.45) ALDH1A1TDP1
Ether SCHEMBL2946585 0.80 TDP1 (0.46) MAPTALDH1A1TDP1
Ethyl Acetate SCHEMBL896035 0.79 TDP1 (0.44) LMNAMAPTALDH1A1TDP1
Diphenylether SCHEMBL1003254 0.79 LMNA (0.51) LMNATDP1NPY5RRAB9A
Acetic Acid Phenyl Ester SCHEMBL19095342 0.78 ELANE (0.55) LMNAELANEGAAMAPTALDH1A1
Acetic Acid Phenyl Ester SCHEMBL1830444 0.78 ELANE (0.58) LMNAELANEGAAMAPTALDH1A1
Ether SCHEMBL55521 0.78 TDP1 (0.55) ALDH1A1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250215318-A1 ETCHING COMPOSITION, ETCHING METHOD USING SAME, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT TOKYO OHKA KOGYO CO., LTD. (JP) 2025-07-03 US disclosed
EP-3961676-B1 ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO LTD (JP) 2025-01-22 EP disclosed
WO-2023204141-A1 ETCHING COMPOSITION, ETCHING METHOD USING SAME, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT 東京応化工業株式会社 2023-10-26 WO disclosed
EP-3702387-B1 PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR ETCHING GLASS SUBSTRATE TOKYO OHKA KOGYO CO LTD (JP) 2023-05-10 EP disclosed
EP-3961676-A1 ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2022-03-02 EP disclosed
CN-111624852-A Photosensitive resin composition and method for etching glass substrate 东京应化工业株式会社 2020-09-04 CN disclosed
EP-3702387-A1 PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR ETCHING GLASS SUBSTRATE TOKYO OHKA KOGYO CO., LTD. (JP) 2020-09-02 EP disclosed
US-20120082791-A1 Coating Composition Amenable to Elastomeric Substrates LIVERSAGE ROBERT RICHARD (US) 2012-04-05 US disclosed
US-20090026425-A1 COMPOSITION COMPRISING POLYESTER AMIDE ACID AND THE LIKE AND INK-JET INK COMPOSITION USING THE SAME CHISSO CORPORATION (JP) 2009-01-29 US disclosed