SCHEMBL8967862

SCHEMBL8967862

C=CCc1cc(C)c(O)c(Cc2cc(CC=C)cc(C)c2O)c1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SHBG P04278 1/20 0.52
TNKS O95271 2/20 0.41
TNKS2 Q9H2K2 1/20 0.41
ALOX5 P09917 2/20 0.40
PTGS1 P23219 2/20 0.40
PTGS2 P35354 1/20 0.40
GABRA1 P14867 4/20 0.40
GABRB2 P47870 4/20 0.40
GAA P10253 3/20 0.40
XDH P47989 1/20 0.40
PARP1 P09874 1/20 0.40
ALDH1A1 P00352 2/20 0.39
KDM4E B2RXH2 2/20 0.39
MEN1 O00255 1/20 0.39
ALDH2 P05091 1/20 0.39
MAPT P10636 1/20 0.39
AKR1B1 P15121 1/20 0.39
HPGD P15428 1/20 0.39
CNR1 P21554 1/20 0.39
CNR2 P34972 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27771899 0.91 SHBG (0.48) SHBGTNKSTNKS2ALOX5PTGS1
SCHEMBL719239 0.86 XDH (0.47) SHBGTNKSTNKS2ALOX5PTGS1
SCHEMBL6946900 0.85 SHBG (0.61) SHBGALOX5PTGS1PTGS2GABRA1
SCHEMBL10046744 0.83 SHBG (0.38) SHBGTNKSTNKS2ALOX5PTGS1
SCHEMBL14213248 0.83 SHBG (0.38) SHBGTNKSTNKS2ALOX5PTGS1
SCHEMBL16501712 0.83 SHBG (0.42) SHBGTNKSTNKS2ALOX5PTGS1
SCHEMBL10586415 0.81 TNKS (0.54) TNKSTNKS2ALOX5PTGS1GABRA1
SCHEMBL9945781 0.81 SHBG (0.51) SHBGALOX5PTGS1PTGS2GABRA1
SCHEMBL4056932 0.78 GABRA1 (0.49) SHBGTNKSALOX5PTGS1PTGS2
SCHEMBL16313712 0.78 TNKS (0.41) SHBGTNKSTNKS2ALOX5PTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0302019-B1 Negative photoresists on the basis of polyphenols and a choice of epoxide or vinyl ether compounds CIBA GEIGY AG (CH) 1996-03-13 EP disclosed
EP-0204659-B1 POLYEPOXYDES AND THEIR USE CIBA-GEIGY AG (CH) 1991-11-21 EP disclosed
US-4994346-A Soluble in aqueous alkaline media when uncured CIBA-GEIGY CORPORATION (US) 1991-02-19 US disclosed
EP-0302019-A2 Negative photoresists on the basis of polyphenols and a choice of epoxide or vinyl ether compounds CIBA-GEIGY AG (CH) 1989-02-01 EP disclosed
US-4677170-A Polyepoxides and the use thereof CIBA-GEIGY CORPORATON (US) 1987-06-30 US disclosed
EP-0204659-A2 Polyepoxydes and their use CIBA-GEIGY AG (CH) 1986-12-10 EP disclosed