Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | GALR3 | O60755 | 2/20 | 0.31 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.31 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.31 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.31 |
| ▸ | PGR | P06401 | 1/20 | 0.31 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.31 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.31 |
| ▸ | HTR1A | P08908 | 1/20 | 0.31 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.31 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.31 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.31 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.31 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.31 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid Butyl Ester SCHEMBL2692488 | 0.92 | ALDH1A1 (0.47) | TDP1ALDH1A1TSHRHSD17B10MAPT | |
| Acetic Acid Propyl Ester SCHEMBL6141126 | 0.91 | TDP1 (0.51) | TDP1ALDH1A1TSHRHSD17B10MAPT | |
| Acetic Acid Pentyl Ester SCHEMBL6531005 | 0.91 | TDP1 (0.44) | TDP1ALDH1A1TSHRMAPTLMNA | |
| Ethyl Acetate SCHEMBL896035 | 0.90 | TDP1 (0.44) | TDP1ALDH1A1TSHRHSD17B10MAPT | |
| Hexyl Acetate SCHEMBL896909 | 0.90 | TDP1 (0.43) | TDP1ALDH1A1TSHRMAPTLMNA | |
| Ether SCHEMBL11290290 | 0.88 | TDP1 (0.50) | TDP1HSD17B10MAPTLMNA | |
| Acetic Acid Isobutyl Ester SCHEMBL1822918 | 0.87 | TDP1 (0.41) | TDP1ALDH1A1TSHRHSD17B10MAPT | |
| Ether SCHEMBL5072571 | 0.85 | TDP1 (0.45) | TDP1ALDH1A1TSHRHSD17B10 | |
| SCHEMBL4333787 | 0.84 | TDP1 (0.68) | TDP1ALDH1A1HSD17B10USP2 | |
| Acetic Acid Propyl Ester SCHEMBL105186 | 0.83 | ALDH1A1 (0.53) | TDP1ALDH1A1TSHRHSD17B10MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250215318-A1 | ETCHING COMPOSITION, ETCHING METHOD USING SAME, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-07-03 | — | — | US | disclosed |
| EP-3961676-B1 | ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2025-01-22 | — | — | EP | disclosed |
| CN-119278503-A | Substrate processing method and substrate manufacturing method | 中央硝子株式会社 | 2025-01-07 | — | — | CN | disclosed |
| US-12187047-B2 | Flow passage member, liquid ejecting head, liquid ejecting apparatus, and method for manufacturing flow passage member | SEIKO EPSON CORPORATION (JP) | 2025-01-07 | — | — | US | disclosed |
| CN-119278504-A | Substrate processing method and substrate manufacturing method | 中央硝子株式会社 | 2025-01-07 | — | — | CN | disclosed |
| US-11945152-B2 | Model material ink set, support material composition, ink set, three-dimensional shaped object, and method for manufacturing three-dimensional shaped object | MAXELL, LTD. (JP) | 2024-04-02 | — | — | US | disclosed |
| EP-3715094-B1 | COMPOSITION FOR MODEL MATERIAL | MAXELL LTD (JP) | 2024-03-27 | — | — | EP | disclosed |
| CN-108026225-B | Resin composition for mold material, resin composition for support material, stereolithography product, and method for producing stereolithography product | 麦克赛尔株式会社 | 2024-03-05 | — | — | CN | disclosed |
| CN-117304414-A | Resin composition for mold material and stereolithography | 麦克赛尔株式会社 | 2023-12-29 | — | — | CN | disclosed |
| WO-2023204141-A1 | ETCHING COMPOSITION, ETCHING METHOD USING SAME, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT | 東京応化工業株式会社 | 2023-10-26 | — | — | WO | disclosed |
| US-20170190949-A1 | TEMPERATURE-STABLE PARAFFIN INHIBITOR COMPOSITIONS | NORRISEAL-WELLMARK, INC. | 2017-07-06 | — | — | US | disclosed |
| US-9498959-B2 | Maintenance unit and liquid ejection device | SEIKO EPSON CORPORATION (JP) | 2016-11-22 | — | — | US | disclosed |
| US-20160263899-A1 | INK JET RECORDING APPARATUS AND METHOD FOR MAINTAINING THE SAME | SEIKO EPSON CORPORATION (JP) | 2016-09-15 | — | — | US | disclosed |
| US-9409398-B2 | Maintenance unit and liquid ejecting apparatus | SEIKO EPSON CORPORATION (JP) | 2016-08-09 | — | — | US | disclosed |
| US-20160144626-A1 | MAINTENANCE UNIT AND LIQUID EJECTING APPARATUS | SEIKO EPSON CORPORATION (JP) | 2016-05-26 | — | — | US | disclosed |
| US-20160121614-A1 | MAINTENANCE UNIT AND LIQUID EJECTION DEVICE | SEIKO EPSON CORPORATION (JP) | 2016-05-05 | — | — | US | disclosed |
| US-9199469-B1 | Ink jet recording apparatus and maintenance thereof | SEIKO EPSON CORPORATION (JP) | 2015-12-01 | — | — | US | disclosed |
| US-20150328897-A1 | INK JET RECORDING APPARATUS AND MAINTENANCE THEREOF | SEIKO EPSON CORPORATION (JP) | 2015-11-19 | — | — | US | disclosed |
| EP-2944472-A1 | INK JET RECORDING APPARATUS AND MAINTENANCE METHOD THEREOF | Seiko Epson Corporation (JP) | 2015-11-18 | — | — | EP | disclosed |
| US-20120082791-A1 | Coating Composition Amenable to Elastomeric Substrates | LIVERSAGE ROBERT RICHARD (US) | 2012-04-05 | — | — | US | disclosed |