SCHEMBL8971095

SCHEMBL8971095

CCC(S(=O)(=O)c1ccc(C)cc1)S(=O)(=O)c1ccc(C)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 3/20 0.50
ALDH1A1 P00352 6/20 0.48
CYP3A4 P08684 1/20 0.47
CYP2C9 P11712 1/20 0.47
CYP2C19 P33261 1/20 0.47
CA2 P00918 4/20 0.46
CA1 P00915 3/20 0.46
CA12 O43570 2/20 0.46
CA9 Q16790 2/20 0.46
CA3 P07451 1/20 0.46
CA6 P23280 1/20 0.46
CA5A P35218 1/20 0.46
CA7 P43166 1/20 0.46
CA5B Q9Y2D0 1/20 0.46
KDM4E B2RXH2 1/20 0.45
MAPT P10636 1/20 0.45
HTT P42858 1/20 0.45
TLR9 Q9NR96 1/20 0.45
SMN1; SMN2 Q16637 1/20 0.43
G6PD P11413 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4712813 0.83 CA2 (0.54) GAAALDH1A1CYP3A4CYP2C9CYP2C19
SCHEMBL13897010 0.83 GAA (0.50) GAAALDH1A1CYP3A4CYP2C9CYP2C19
SCHEMBL881946 0.81 GBA1 (0.49) GAAALDH1A1CYP3A4CYP2C9CYP2C19
SCHEMBL12605150 0.81 GBA1 (0.49) GAAALDH1A1CYP3A4CYP2C9CYP2C19
SCHEMBL8970815 0.80 CA12 (0.47) GAAALDH1A1CYP3A4CYP2C9CYP2C19
SCHEMBL13276428 0.80 PSIP1 (0.54) GAAALDH1A1CA2CA1CA12
SCHEMBL8778760 0.79 GAA (0.46) GAAALDH1A1CYP3A4CYP2C9CYP2C19
SCHEMBL8971175 0.79 MCHR1 (0.47) GAAALDH1A1CYP3A4CYP2C9CYP2C19
SCHEMBL7614659 0.77 MCHR1 (0.50) GAAALDH1A1CYP3A4CYP2C9CYP2C19
SCHEMBL8970647 0.77 MCHR1 (0.50) GAAALDH1A1CYP3A4CYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021079679-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD 信越化学工業株式会社 2021-04-29 WO disclosed
CN-108459469-A Pattern forming method 信越化学工业株式会社 2018-08-28 CN disclosed
WO-2017193288-A1 SYNTHESIS OF PHOSPHINE LIGANDS BEARING TUNABLE LINKAGE: METHODS OF THEIR USE IN CATALYSIS THE HONG KONG POLYTECHNIC UNIVERSITY SHENZHEN RESEARCH INSTITUTE (CN) 2017-11-16 WO disclosed
CN-102516141-B Labeling method for hydroxytamine transporter imaging agent [<18>F]-FPBM UNIV BEIJING NORMAL 2014-11-26 CN disclosed
EP-0493601-B1 LIQUID-CRYSTAL COPOLYMER, PRODUCTION THEREOF, DIENE COMPOUND USED IN SAID PRODUCTION, AND PRODUCTION OF SAID COMPOUND IDEMITSU KOSAN CO (JP) 1996-03-20 EP disclosed
US-5425897-A Electrooptics IDEMITSU KOSAN CO., LTD. (JP) 1995-06-20 US disclosed
US-5380915-A Copolymers of polydimethylsiloxane with diene ethers IDEMITSU KOSAN CO., LTD. (JP) 1995-01-10 US disclosed
US-5281685-A Polyether pendant groups, polysiloxane repeating units IDEMITSU KOSAN CO., LTD. (JP) 1994-01-25 US disclosed
EP-0493601-A1 LIQUID-CRYSTAL COPOLYMER, PRODUCTION THEREOF, DIENE COMPOUND USED IN SAID PRODUCTION, AND PRODUCTION OF SAID COMPOUND IDEMITSU KOSAN COMPANY LIMITED (JP) 1992-07-08 EP disclosed