SCHEMBL8973665

SCHEMBL8973665

CSc1ccc([N+](=O)[O-])cc1[N+](=O)[O-]

nearest known ligand 0.72

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TXNRD1 Q16881 1/20 0.72
TXNRD3 Q86VQ6 1/20 0.72
TXNRD2 Q9NNW7 1/20 0.72
MAPT P10636 6/20 0.58
HTT P42858 2/20 0.57
LMNA P02545 2/20 0.57
GAA P10253 1/20 0.57
NPSR1 Q6W5P4 1/20 0.57
ALDH1A1 P00352 4/20 0.56
SMN1; SMN2 Q16637 2/20 0.56
MEN1 O00255 1/20 0.56
KMT2A Q03164 1/20 0.56
TDP1 Q9NUW8 1/20 0.55
GPR35 Q9HC97 2/20 0.53
TP53 P04637 1/20 0.53
HPGD P15428 1/20 0.53
TSHR P16473 1/20 0.53
MAPK1 P28482 1/20 0.53
HIF1A Q16665 1/20 0.53
MGLL Q99685 5/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8379730 0.85 TXNRD1 (0.68) TXNRD1TXNRD3TXNRD2MAPTHTT
SCHEMBL6161726 0.84 TXNRD1 (0.78) TXNRD1TXNRD3TXNRD2MAPTHTT
SCHEMBL1032814 0.84 TXNRD1 (1.00) TXNRD1TXNRD3TXNRD2MAPTHTT
SCHEMBL30128616 0.84 TXNRD1 (0.78) TXNRD1TXNRD3TXNRD2MAPTHTT
SCHEMBL3990991 0.82 TXNRD1 (0.75) TXNRD1TXNRD3TXNRD2MAPTHTT
SCHEMBL16139485 0.81 TXNRD1 (0.68) TXNRD1TXNRD3TXNRD2MAPTHTT
SCHEMBL30168201 0.81 ALDH1A1 (0.62) TXNRD1TXNRD3TXNRD2MAPTHTT
SCHEMBL16961634 0.81 ALDH1A1 (0.62) TXNRD1TXNRD3TXNRD2MAPTHTT
SCHEMBL7597811 0.81 TSHR (0.62) TXNRD1TXNRD3TXNRD2MAPTHTT
SCHEMBL10332736 0.81 TXNRD1 (0.72) TXNRD1TXNRD3TXNRD2MAPTHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9188862-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same FUJIFILM CORPORATION (JP) 2015-11-17 US disclosed
US-20140295332-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME FUJIFILM CORPORATION (JP) 2014-10-02 US disclosed
WO-2013100158-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME FUJIFILM CORPORATION (JP) 2013-07-04 WO disclosed
EP-0335274-B1 Formation of nitrophenyl ethers from polyols and nitroanisoles DOW CHEMICAL CO (US) 1996-03-13 EP disclosed
US-4960950-A Formation of nitrophenyl ethers from polyols and nitroanisoles THE DOW CHEMICAL COMPANY (US) 1990-10-02 US disclosed
EP-0335274-A2 Formation of nitrophenyl ethers from polyols and nitroanisoles THE DOW CHEMICAL COMPANY (US) 1989-10-04 EP disclosed
US-4214094-A ANTILIPEMIC AGENTS FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 1980-07-22 US disclosed