SCHEMBL8976830

SCHEMBL8976830

[N-]=[N+]=C1C=Cc2c(cccc2S(=O)(=O)Cl)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL8976840 0.84 TTR (0.32)
SCHEMBL14500182 0.76
SCHEMBL17034693 0.69
Hydrochloric Acid SCHEMBL8976835 0.69 TTR (0.32)
SCHEMBL823909 0.68
SCHEMBL899605 0.68
SCHEMBL13155736 0.67 PTPRC (0.31)
SCHEMBL8976633 0.67
Charcoal, Activated SCHEMBL8036863 0.67
SCHEMBL10590653 0.66

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0451170-B1 SELECTED TRINUCLEAR NOVOLAK OLIGOMER DERIVATIVES AS PHOTOACTIVE COMPOUNDS AND THEIR USE IN RADIATION SENSITIVE MIXTURES OCG MICROELECTRONIC MATERIALS (US) 1996-04-24 EP disclosed
EP-0685766-A1 Selected trinuclear novolak oligomers and their use in photo-active compounds and radiation sensitive mixtures OCG MICROELECTRONIC MATERIALS, INC. (US) 1995-12-06 EP disclosed
US-4992356-A Positive photoresists OLIN HUNT SPECIALTY PRODUCTS INC. (US) 1991-02-12 US disclosed
US-4992596-A Selected trinuclear novolak oligomers and their use in photoactive compounds and radiation sensitive mixtures OLIN HUNT SPECIALTY PRODUCTS INC. (US) 1991-02-12 US disclosed
US-4957846-A PHOTORESISTS, PHOTOLITHOGRAPHY, PRINTED CIRCUITS OLIN HUNT SPECIALTY PRODUCTS INC. (US) 1990-09-18 US disclosed